Quantum Dot Film Barrier Composition for Moisture Protection
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Solution Overview
Problem
Existing quantum dot films face challenges in preventing oxygen and moisture penetration, leading to oxidation and degradation of quantum dots, especially in high temperature and high humidity environments, and are prone to edge discoloration, which affects their luminance and durability.
Innovation Solution
A composition for forming a quantum dot layer comprising active energy ray-curable compounds with ethylenically unsaturated double bonds, thiol compounds with multiple mercapto groups, photo-initiators, quantum dot particles, and scattering particles, where the thiol compound is present in a specific equivalent ratio and the active energy ray-curable compound has a calculated W value of 3.0 or more, forming a robust barrier against oxygen and moisture.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a polymer matrix with Tg of 20°C or more is used to form the quantum dot layer, then the barrier performance against oxygen and moisture is improved, but the vulnerability of quantum dot particles to oxygen and moisture cannot be fully supplemented
Solution Approach 1:
The patent uses a composite resin composition combining (meth)acrylic acid and an epoxy compound to create a matrix that provides superior barrier properties against oxygen and moisture penetration, effectively protecting quantum dot particles while maintaining processability
2Ease of manufacture
If epoxy(meth)acrylate resin containing hydroxyl groups is used as the matrix resin, then the quantum dot layer can be formed, but the high viscosity makes lamination difficult and the layer becomes vulnerable to oxygen and moisture penetration
Solution Approach 1:
The patent modifies the chemical composition parameters of the matrix resin by using a specific combination of (meth)acrylic acid and epoxy compound in controlled ratios, achieving optimal balance between viscosity for lamination and barrier performance against oxygen and moisture
3Productivity
If functional groups with hydrogen bonding properties (hydroxyl, carboxyl, urethane groups) are present in the polymerizable compounds, then the compounds can polymerize effectively, but these hydrophilic groups degrade the performance of quantum dot particles susceptible to moisture
Solution Approach 1:
The patent strategically places hydrophobic character in the matrix resin composition to specifically protect the quantum dot particles from moisture while maintaining polymerization efficiency through the selected epoxy compound and (meth)acrylic acid combination
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents quantum dot oxidation, maintains excellent luminance in high temperature and high humidity conditions, and provides durability by preventing edge discoloration, resulting in reliable performance for quantum dot films, backlight units, and liquid crystal displays.
Implementation Method 1
active energy ray-curable compound (A) having an ethylenically unsaturated double bond
Data Source
AI summary
The present invention relates to a composition for forming a quantum dot layer comprising: at least one active energy ray-curable compound (A) having an ethylenically unsaturated double bond, at least one thiol compound (B) having at least two mercapto groups in one molecule, a photo-initiator (C); quantum particles (D), and scattering particles (E), wherein the composition contains 0.20-0.80 equivalents of the compound (B) per one equivalent of the compound (A), and the W value of the compound (A) calculated by Math formula 1 is 3.0 or more, and the present invention also relates to a quantum dot film, a backlight unit, and a liquid crystal display.