Quantum Dot Photodetector Filtration for Lower Dark Current

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing photodetectors face challenges in reducing dark current and achieving high manufacturing yield, particularly when using quantum dots due to the formation of soft aggregates that cause unevenness in the semiconductor film.

Innovation Solution

A method involving the filtration of a quantum dot dispersion liquid with specific parameters, including a pore diameter of less than 0.45 µm and the use of certain materials and ligands, followed by forming a semiconductor film on a first electrode and a second electrode, specifically using a sputtering method for the second electrode.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If quantum dot dispersion liquid is used to form semiconductor film, then the photodetector can be manufactured, but soft aggregates form causing unevenness in the semiconductor film which increases dark current

Engineering Contradiction:
Improveuniformity of semiconductor filmVSAvoiddark current
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The quantum dot dispersion liquid is filtered before being used to form the semiconductor film. This preliminary filtration action removes soft aggregates and impurities from the dispersion liquid, preventing them from being incorporated into the semiconductor film during the subsequent coating process, thereby ensuring film uniformity and reducing dark current.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

A filter is introduced as an intermediary component between the quantum dot dispersion liquid and the semiconductor film formation process. The filter acts as a mediator that selectively removes harmful soft aggregates while allowing the quantum dots and necessary components to pass through, enabling the formation of a uniform semiconductor film with reduced dark current.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Object-generated harmful factors

If filtration is applied to quantum dot dispersion liquid, then dark current is reduced, but manufacturing process complexity increases

Engineering Contradiction:
Improvedark currentVSAvoidmanufacturing process complexity
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The patent specifies particular parameters for the filtration process, including pore diameter range (0.01 µm to 1 µm) and filter material composition. By optimizing these parameters, the filtration step achieves effective dark current reduction while maintaining reasonable manufacturing complexity. The specified parameters ensure that the filter removes harmful aggregates without requiring excessively complex filtration systems.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If pore diameter of filter is less than 0.45 µm, then soft aggregates are suppressed, but manufacturing difficulty increases

Engineering Contradiction:
Improvefilm uniformityVSAvoidfiltration process difficulty
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent specifies a pore diameter range of 0.01 µm to 1 µm for the filter, with particular emphasis on filters having pore diameter less than 0.45 µm to effectively suppress soft aggregates. This parameter specification balances film uniformity requirements with manufacturing feasibility, as the defined range achieves the necessary filtration effectiveness without requiring extremely fine filters that would be difficult to manufacture and operate.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively suppresses the formation of soft aggregates, leading to a photodetector with reduced dark current and improved manufacturing yield.

Implementation Method 1

filtering a quantum dot dispersion liquid containing quantum dots having a maximal absorption in terms of absorbance in a wavelength range of 900 to 1700 nm, a ligand, and a solvent

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Implementation Method 2

quantum dots having a maximal absorption in terms of absorbance in a wavelength range of 900 to 1700 nm

Methodology Applied
Scientific EffectLight absorption: Absorption (EM radiation)

Implementation Method 3

the second electrode is formed on the semiconductor film by a sputtering method

Methodology Applied
Scientific EffectSputtering: Sputtering

Data Source

PatentEP4661082A1Method for manufacturing light-detecting element and method for manufacturing image sensor
Publication Date: 2025.12.10 FUJIFILM CORP
  • EP4661082A1 patent drawing
  • EP4661082A1 patent drawing
  • EP4661082A1 patent drawing

AI summary

A method for manufacturing a photodetector and a method for manufacturing an image sensor includes forming a first electrode on a support; filtering a quantum dot dispersion liquid containing quantum dots having a maximal absorption in terms of absorbance in a wavelength range of 900 to 1700 nm, a ligand, and a solvent, and forming a semiconductor film containing quantum dots on the first electrode by using the filtered quantum dot dispersion liquid; and forming a second electrode on the semiconductor film.