Quantum Dot Light Emitting Panel Photosensitive Polymer Patterning
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Solution Overview
Problem
The existing photoresist-based patterning processes for quantum dot light emitting panels often damage the quantum dot film layers, leading to reduced light emitting efficiency and environmental concerns due to the use of toxic solvents.
Innovation Solution
A quantum dot light emitting panel is designed with a photosensitive polymer film layer between the quantum dot light emitting layer and the electron transfer layer. This layer has photosensitive portions that break when subjected to preset light irradiation, allowing for precise patterning without damaging the quantum dot film layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photoresist-based patterning process is used to form patterned quantum dots, then quantum dot patterning can be achieved, but the quantum dot film layers will be damaged and light emitting efficiency will be reduced
Solution Approach 1:
The patent introduces a photosensitive polymer film layer as an intermediary between the quantum dot light emitting layer and the electron transfer layer. This intermediary layer undergoes photodecomposition under preset light irradiation to form patterned structures, enabling quantum dot patterning without direct contact with damaging photoresist chemicals. The polymer film acts as a sacrificial mediator that protects the quantum dot film integrity while achieving precise patterning.
2Manufacturing precision
If conventional photoresist process is used for patterning, then pattern formation is achieved, but toxic solvents and developing solutions are required causing environmental harm
Solution Approach 1:
The patent replaces the chemical-based photoresist processing system with a photosensitive polymer film system that decomposes under light irradiation. This substitution eliminates the need for toxic developing solutions and chemical solvents, using instead a controlled photodecomposition process that is environmentally friendly while maintaining precise pattern formation capability.
Solution Approach 2:
The patent changes the fundamental parameter of the patterning process from chemical development to light-induced decomposition. The photosensitive polymer film is designed to undergo chain scission and decomposition when exposed to preset light wavelengths, transforming the patterning mechanism from a chemical etching process to a photochemical decomposition process that avoids toxic substances.
3Adaptability or versatility
If photoresist is used to pattern quantum dots of different colors, then full-color display is achieved, but the developing solution damages the quantum dot film layers
Solution Approach 1:
The patent segments the patterning process by applying the photosensitive polymer film layer method sequentially for each color (red, green, blue quantum dots). Each color layer is patterned independently through controlled light irradiation and decomposition of the polymer film, avoiding the need for a single damaging photoresist process. This segmented approach enables full-color display while protecting each quantum dot film layer during its specific patterning step.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution enables the creation of full-color, high-resolution quantum dot panels with improved light emitting efficiency, as it avoids the use of damaging developing solutions and reduces environmental impact by eliminating the need for toxic solvents.
Implementation Method 1
having photosensitive portions in a one-to-one correspondence with the light emitting portions, and configured such that molecular chains break when the photosensitive polymer film layer is subjected to preset light irradiation
Data Source
AI summary
The present disclosure provides a quantum dot light emitting panel, a display device, and a manufacturing method. The quantum dot light emitting panel comprises: a base substrate; a cathode layer, located on a side of the base substrate; an electron transfer layer, located on a side of the cathode layer located away from the base substrate; a quantum dot light emitting layer, located on a side of the electron transfer layer located away from the cathode layer, and having at least two light emitting portions having mutually different wavelength ranges of emitted light; a photosensitive polymer film layer, located between the quantum dot light emitting layer and the electron transfer layer, having photosensitive portions in a one-to-one correspondence with the light emitting portions, and configured such that molecular chains break when the photosensitive polymer film layer is subjected to preconfigured light irradiation; and an anode layer, located on a side of the quantum dot light emitting layer located away from the photosensitive polymer film layer.