Quantum Dot Patterning via Photoinitiator Quenching

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Solution Overview

Problem

Current methods for patterning quantum dot layers in quantum dot light-emitting diodes (QLEDs) face challenges in achieving high pixel density and color accuracy, as existing techniques like inkjet printing and photolithography often result in low resolution and monochrome devices with low pixel density.

Innovation Solution

A patterning method involving a quantum dot layer with a photoinitiator, where a mask plate shields the layer and ultraviolet light is used to quench quantum dots in specific portions, forming a patterned layer with inactive and active regions, allowing for high pixel density and color variation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If inkjet printing or photolithography is used for patterning quantum dot layers, then the manufacturing process can be implemented, but the resolution and pixel density are low

Engineering Contradiction:

Improvepatterning resolutionVSAvoidpixel density

Core Design Contradiction:

Manufacturing precisionVSProductivity

Solution Approach 1:

The patent replaces mechanical patterning methods (inkjet printing, photolithography) with a photochemical mechanism. By incorporating a photoinitiator into the quantum dot layer and using light irradiation through a mask, the method achieves high-resolution patterning without mechanical contact or complex lithography equipment, thereby improving both resolution and pixel density

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the chemical state of the quantum dot layer by introducing a photoinitiator that undergoes photochemical reaction upon light exposure. This parameter change (from stable to reactive state) enables precise spatial control of quantum dot agglomeration, achieving high-resolution patterns that were not possible with conventional methods

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If conventional patterning methods are used, then devices can be manufactured, but color accuracy and color variation are limited resulting in monochrome devices

Engineering Contradiction:

Improvecolor accuracyVSAvoidcolor variation

Core Design Contradiction:

Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent applies local quality by creating different regions (active and inactive) within the quantum dot layer through selective light irradiation. The mask plate defines specific patterns that receive light to become inactive regions, while unexposed regions remain active and emit light. This local differentiation enables color variation and accurate color rendering in the final display device

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The photoinitiator acts as an intermediary substance that mediates between the light irradiation and the quantum dots. Upon exposure to light through the mask, the photoinitiator triggers agglomeration of quantum dots in the exposed regions, thereby controlling which areas emit light and enabling precise color patterning

Inventive Principle:

Principle #24Intermediary (Mediator)

3Manufacturing precision

If quantum dots are quenched by light irradiation, then patterned regions are formed, but the photoinitiator remains in the layer causing potential issues

Engineering Contradiction:

Improvepatterning controlVSAvoidphotoinitiator residue

Core Design Contradiction:

Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent performs a preliminary baking treatment before light irradiation to remove excess solvent and stabilize the quantum dot layer. This preliminary action prepares the layer for subsequent photopatterning and helps control the final structure, reducing potential issues from residual materials

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent applies a post-baking treatment after light irradiation to remove the photoinitiator from the patterned quantum dot layer. This discarding of the photoinitiator (which has completed its function of triggering agglomeration) eliminates potential harmful effects of residual photoinitiator while preserving the desired pattern structure

Inventive Principle:

Principle #34Discarding and recovering

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables the creation of colored quantum dot light-emitting devices with high pixel density by precisely controlling the quantum dot agglomeration and emission, overcoming the limitations of existing techniques.

Implementation Method 1

forming a quantum dot layer, in which the quantum dot layer comprises quantum dots and a photoinitiator; irradiating a preset portion of the quantum dot layer by light having a preset wavelength to quench the quantum dot in the preset portion

Methodology Applied

Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS11309452B2Patterning method of quantum dot layer, quantum dot device and manufacturing method thereof

Publication Date: 2022.04.19 BOE TECHNOLOGY GROUP CO LTD

AI summary

A patterning method of a quantum dot layer, a quantum dot layer pattern, a quantum dot device, a manufacturing method of the quantum dot device, and a display apparatus are provided. The patterning method of the quantum dot layer includes: forming a quantum dot layer, in which the quantum dot layer includes quantum dots and a photoinitiator; irradiating a preset portion of the quantum dot layer by light having a preset wavelength to quench the quantum dots in the preset portion and form a patterned quantum dot layer.