Quantum Dot Display Module Patterning With Plasma-Etched Openings

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Solution Overview

Problem

The accuracy of printing quantum dots on LED display screens using ink-jet printing is limited to the micron size range, which affects the precision and quality of full-color display.

Innovation Solution

A manufacturing method involving plasma etching is employed to form quantum dot layers within precise openings in a semiconductor device, allowing for sub-micron or nanometer-sized printing of quantum dots, combined with a DBR film layer to filter blue light.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If ink-jet printing is used to print quantum dots on LED display screens, then the process is simple and easy to manufacture, but the printing accuracy is limited to the micron size range

Engineering Contradiction:
Improveprinting accuracyVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent replaces the mechanical ink-jet printing system with a plasma-based processing system. Plasma etching is used to create precise openings and plasma deposition is used to form quantum dot layers with sub-micron or nanometer precision, eliminating the accuracy limitations of mechanical ink-jet printing while maintaining manufacturability through established semiconductor processing techniques

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the fundamental processing parameters from macro-scale ink-jet deposition to plasma-based nanometer-scale control. By using plasma etching to define openings and plasma deposition to form quantum dot layers, the process achieves sub-micron printing accuracy through controlled plasma reactions and deposition rates, transforming the precision mechanism from mechanical positioning to plasma field control

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If quantum dots are printed with lower accuracy, then the manufacturing process is simpler, but the display quality and definition are reduced

Engineering Contradiction:
Improvequantum dot placement precisionVSAvoidprocessing steps
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent segments the quantum dot formation process into distinct plasma-based steps: plasma etching to create openings, plasma deposition to form quantum dot layers, and selective removal of quantum dot layers. This segmentation allows each step to be optimized for precision, achieving sub-micron placement accuracy while maintaining clear process control and manufacturability

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces plasma as an intermediary medium to achieve precise quantum dot placement. Plasma serves as both the etching agent to create openings and the deposition medium to form quantum dot layers, enabling sub-micron precision through controlled plasma reactions without requiring complex mechanical positioning systems

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Improves the printing accuracy of quantum dots to achieve high-definition full-color displays by ensuring precise placement and color conversion, enhancing the display quality of LED screens.

Implementation Method 1

The quantum dots are excited by the blue LED or the deep purple LED light source so that the quantum dots emit red light and green light

Methodology Applied
Scientific EffectPhotoluminescence: Photoluminescence

Implementation Method 2

etching away the first quantum dot layer in the outer region of the first opening by plasma etching

Methodology Applied
Scientific EffectPlasma etching: Plasma

Implementation Method 3

forming a DBR film layer that filters blue light

Methodology Applied
Scientific EffectOptical interference: Interference

Data Source

PatentUS12593543B2Display module manufacturing method and display screen
Publication Date: 2026.03.31 SHENZHEN SITAN TECH CO LTD
  • US12593543B2 patent drawing
  • US12593543B2 patent drawing
  • US12593543B2 patent drawing

AI summary

The present application discloses a manufacturing method for a display module and a display screen. The method includes: forming a semiconductor device by pre-processing a semiconductor epitaxial wafer; forming a first transparent layer on a substrate surface of the semiconductor device; forming a first opening exposing the substrate by etching the first transparent layer; forming a first quantum dot layer on the substrate surface exposed by the first opening and the surface of the first transparent layer; etching away the first quantum dot layer in the outer region of the first opening, and remaining the first quantum dot layer inside the first opening; and forming a DBR film layer that filters blue light.