Quantum-Dot Photosensitive Resin Composition for Micro-LED Patterning
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Solution Overview
Problem
Existing methods for forming color conversion structures on LED arrays for displays face challenges in miniaturization and achieving high lithography resolution and favorable luminous properties, particularly in micro-LED displays.
Innovation Solution
A photosensitive resin composition comprising a (meth)acryloyl group-containing resin, a photo-radical generator, and a polymer where a quantum dot with a silane coupling agent is copolymerized with alkoxysilane or its hydrolysate, along with optional components like a surfactant and crosslinking agent, to form a film with high lithography resolution and luminous properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography methods are used for color conversion structure formation, then the process is relatively simple, but the lithography resolution is insufficient and miniaturization is limited
Solution Approach 1:
The patent employs a composite photosensitive resin composition integrating multiple functional components: (A) (meth)acryloyl group-containing resin for crosslinking, (B) photo-radical generator for photopolymerization, and (C) quantum dots with silane coupling agents for color conversion. This composite formulation achieves high lithography resolution while maintaining processability through synergistic material interactions.
Solution Approach 2:
The patent optimizes specific parameters including the double bond equivalent of component (A) at 240-1,000 g/mol, weight-average molecular weight at 5,000-100,000 g/mol, and component (C) content at 5-80 mass%. These parameter adjustments enable precise control over crosslinking density, film formation, and pattern resolution, achieving high lithography performance.
2Reliability
If quantum dots are used for color conversion, then luminous properties are improved, but quantum dots may escape during development process
Solution Approach 1:
The patent introduces silane coupling agents as intermediary substances that coordinate with quantum dots. These coupling agents form bridging structures between quantum dots and the polymer matrix, preventing quantum dot escape during development while preserving their luminous properties. The silane coupling agent acts as a mediator that stabilizes quantum dots within the photosensitive resin composition.
Solution Approach 2:
The patent applies different functional properties to different components: quantum dots provide localized luminous functionality, while silane coupling agents provide localized adhesion and stability. This local quality differentiation allows quantum dots to maintain their color conversion efficiency while being securely anchored in specific regions of the polymer matrix.
3Manufacturing precision
If high crosslinking density is achieved for good pattern shape, then pattern definition is improved, but film quantity decrease in exposed portion may occur
Solution Approach 1:
The patent carefully controls the double bond equivalent of component (A) within 240-1,000 g/mol and weight-average molecular weight between 5,000-100,000 g/mol. These parameter optimizations balance crosslinking density for pattern definition while preventing excessive resin consumption during exposure and development, maintaining adequate film quantity in exposed portions.
4Volume of moving object
If miniaturization of LED arrays is pursued for small displays, then display size is reduced, but lithography resolution requirements increase
Solution Approach 1:
The patent develops a specialized composite photosensitive resin composition with optimized molecular weights and crosslinking densities that enable high-resolution patterning at micro-scales. The combination of low-to-moderate molecular weight resins with controlled double bond equivalents allows achieving sub-10 micrometer pattern resolution necessary for miniaturized LED arrays.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of fine patterns with high resolution and favorable luminous properties, suitable for micro-LED displays, by preventing quantum dot escape and ensuring good film shape and adhesion, while maintaining luminous properties.
Implementation Method 1
a (meth)acryloyl group-containing resin and a photo-radical generator
Implementation Method 2
a polymer in which a quantum dot having a silane coupling agent coordinated is copolymerized with alkoxysilane
Implementation Method 3
copolymerized with alkoxysilane, alkoxysilane hydrolysate, or condensate thereof
Implementation Method 4
copolymerized with alkoxysilane, alkoxysilane hydrolysate, or condensate thereof
Data Source
AI summary
The present invention is a photosensitive resin composition including: (A) a (meth)acryloyl group-containing resin; (B) a photo-radical generator; and (C) a polymer in which a quantum dot having a silane coupling agent coordinated is copolymerized with alkoxysilane, alkoxysilane hydrolysate, or condensate thereof. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film obtained by using the photosensitive resin composition; patterning processes using these; and a light emitting device including a cured film obtained by using the photosensitive resin film.