Quantum Dot Nanoimprint Template for UV Leakage and Alignment Marks
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In nanoimprint lithography, unintended curing of UV-curable resist occurs due to ultraviolet light leakage, and alignment marks are difficult to observe using existing templates, which affects the precision and efficiency of the semiconductor device production process.
Innovation Solution
A template with a mesa structure and a film containing quantum dots that absorb ultraviolet light and emit visible light is used, preventing unintended curing of the UV-curable resist and facilitating the observation of alignment marks by converting ultraviolet light to visible light, thereby improving the precision and throughput of the process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a conventional template is used for nanoimprint lithography, then the pattern transfer process can be performed, but ultraviolet light leakage causes unintended curing of the UV-curable resist
Solution Approach 1:
The patent converts the harmful ultraviolet light leakage into a beneficial effect by using quantum dots that absorb the leaked UV light and convert it to visible light. This visible light then serves to illuminate alignment marks, transforming the harmful UV leakage into a useful illumination source that simultaneously prevents unintended resist curing and enables alignment mark observation
Solution Approach 2:
The quantum dot film acts as an intermediary substance between the UV light source and the UV-curable resist. It absorbs the harmful UV radiation and converts it to visible light, which does not cause unintended curing of the resist. This intermediary layer effectively blocks the harmful effect while maintaining the useful alignment function
2Ease of operation
If a conventional template is used, then the structure is simple, but alignment marks are difficult to observe
Solution Approach 1:
The quantum dot film performs multiple functions simultaneously: it blocks UV light to prevent unintended resist curing, converts UV light to visible light for alignment mark illumination, and enhances the visibility of alignment marks. This multi-functionality resolves the contradiction by adding capability without requiring separate components
Solution Approach 2:
The quantum dots exhibit photoluminescence by absorbing ultraviolet light and emitting visible light. This color change from UV to visible range enables the alignment marks to be observed under visible light illumination, solving the observation difficulty without complicating the template structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The template effectively prevents unintended curing of the UV-curable resist and enhances the visibility of alignment marks, leading to improved precision and increased throughput in semiconductor device production by ensuring accurate pattern transfer and alignment.
Implementation Method 1
a film containing a quantum dot on the main surface outside of the mesa structure... quantum dots that absorb ultraviolet light and emit visible light
Implementation Method 2
quantum dots that absorb ultraviolet light... preventing unintended curing of the UV-curable resist
Data Source
AI summary
According to one embodiment, a template for nanoimprint lithography includes a substrate having a main surface and a mesa structure on the main surface. The mesa structure has an upper surface that can be patterned with recesses or the like. A film containing a quantum dot or quantum dots is on the main surface other than the upper surface of the mesa structure. The quantum dot can absorb ultraviolet light and emit visible light.