Quantum Well Doping via Band Alignment

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Solution Overview

Problem

Controlling doping in wide band gap semiconductor materials, such as Aluminum Gallium Nitride, is challenging due to deep impurity levels and inefficient activation, limiting the conductivity of devices like deep ultraviolet light emitting diodes and transistors.

Innovation Solution

A structure with a quantum well and adjacent barrier is designed, where the target band discontinuity coincides with the dopant's activation energy, and the doping level is selected to facilitate a real space transfer of holes, aligning the dopant energy level with the valence energy band edge or ground state energy of the quantum well, thereby reducing activation energy and enhancing conductivity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional doping methods are used in wide band gap semiconductor materials, then the doping process is simple, but the impurity activation efficiency is low and conductivity is limited

Engineering Contradiction:
ImproveconductivityVSAvoiddoping control difficulty
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent changes the energy parameter of the doping process by creating quantum confined structures with specific band gaps. By engineering the quantum well and barrier layers with precise thicknesses and compositions, the dopant energy levels are shifted to achieve higher activation efficiency and improved conductivity in wide band gap materials

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs composite quantum well/barrier structures where different semiconductor materials with varying band gaps are combined. This composite approach allows optimization of both the doping characteristics and electrical properties, achieving high conductivity while maintaining the manufacturability of the device

Inventive Principle:
Principle #40Composite materials

2Temperature

If the dopant energy level is deep in the band gap, then the material maintains its wide band gap properties, but the impurity activation becomes inefficient

Engineering Contradiction:
Improveoperational stabilityVSAvoidimpurity activation efficiency
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

The patent modifies the energy parameter by creating quantum confined states that shift the dopant energy levels. The quantum well structure with engineered band gap creates discrete energy states that enhance impurity activation efficiency while preserving the operational stability provided by the wide band gap material properties

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in a more efficient real space transfer of holes and improved conductivity in semiconductor devices, particularly in deep ultraviolet light emitting diodes and transistors, by aligning dopant energy levels with the quantum well's energy bands, enhancing device performance.

Implementation Method 1

A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier

Methodology Applied
Scientific EffectBand alignment:

Implementation Method 2

a target doping level for the quantum well and/or adjacent barrier can be selected to facilitate a real space transfer of holes across the barrier

Methodology Applied
Scientific EffectReal space transfer:

Implementation Method 3

a dopant energy level of a dopant in the adjacent barrier coincides with at least one of: a valence energy band edge for the quantum well or a ground state energy for free carriers in a valence energy band for the quantum well

Methodology Applied
Scientific EffectDopant activation:

Data Source

PatentUS9997667B2Semiconductor material doping
Publication Date: 2018.06.12 SENSOR ELECTRONIC TECHNOLOGY INC
  • US9997667B2 patent drawing
  • US9997667B2 patent drawing
  • US9997667B2 patent drawing

AI summary

A solution for designing and/or fabricating a structure including a quantum well and an adjacent barrier is provided. A target band discontinuity between the quantum well and the adjacent barrier is selected to coincide with an activation energy of a dopant for the quantum well and/or barrier. For example, a target valence band discontinuity can be selected such that a dopant energy level of a dopant in the adjacent barrier coincides with a valence energy band edge for the quantum well and/or a ground state energy for free carriers in a valence energy band for the quantum well. Additionally, a target doping level for the quantum well and/or adjacent barrier can be selected to facilitate a real space transfer of holes across the barrier. The quantum well and the adjacent barrier can be formed such that the actual band discontinuity and/or actual doping level(s) correspond to the relevant target(s).