Quartz Template Depth Adjustment for Precise Pattern Transfer

Solution Overview

Problem

Current methods for manufacturing semiconductor templates using nanoimprint lithography face challenges in achieving precise pattern transfer and depth adjustment of depressions, leading to difficulties in processing objects into predetermined shapes due to limitations in depth control of imprint material layers.

Innovation Solution

A method involving substrate preparation with a quartz substrate having protrusions and depressions, where a protective film with varying thickness regions is formed and processed to expose the depression bottom, allowing for further depth adjustment and precise pattern transfer using a mask made from the remaining film regions, enabling enhanced processing accuracy and depth control without the need for new templates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional nanoimprint lithography is used for template manufacturing, then pattern formation is achieved, but depth control of depressions is insufficient and pattern transfer accuracy deteriorates

Engineering Contradiction:

Improvedepth control of depressionsVSAvoidpattern transfer accuracy

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The invention performs preliminary depth adjustment by forming a protective film with thickness variation corresponding to the depression depth, then selectively removing portions of the protective film to expose the depression bottom. This preliminary action enables subsequent precise pattern transfer by ensuring the imprint material layer can reach the depression bottom, thereby resolving the contradiction between depth control and pattern transfer accuracy.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The invention changes the physical parameter of the protective film thickness to match the depression depth profile. By forming a protective film where the thickness varies spatially (thinner at depression bottoms, thicker on protrusions), and then selectively removing portions, the method achieves precise depth control that enables accurate pattern transfer, resolving the contradiction between these two parameters.

Inventive Principle:

Principle #35Parameter changes

2Manufacturing precision

If template depth is increased to form deeper features, then pattern transfer accuracy improves, but manufacturing complexity increases requiring new templates

Engineering Contradiction:

Improvepattern transfer accuracyVSAvoidtemplate manufacturing process

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention performs preliminary depth adjustment by forming a protective film with thickness variation corresponding to the depression depth, then selectively removing portions of the protective film to expose the depression bottom. This preliminary action enables subsequent precise pattern transfer by ensuring the imprint material layer can reach the depression bottom, thereby resolving the contradiction between depth control and pattern transfer accuracy.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The invention changes the physical parameter of the protective film thickness to match the depression depth profile. By forming a protective film where the thickness varies spatially (thinner at depression bottoms, thicker on protrusions), and then selectively removing portions, the method achieves precise depth control that enables accurate pattern transfer, resolving the contradiction between these two parameters.

Inventive Principle:

Principle #35Parameter changes

3Ease of manufacture

If uniform protective film is formed on substrate, then manufacturing process is simplified, but depth adjustment capability is lost

Engineering Contradiction:

Improveprotective film formationVSAvoiddepth adjustment capability

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The invention applies local quality by forming a protective film with spatially varying thickness where the film thickness corresponds to the underlying topography (thinner over depression bottoms, thicker over protrusions). This local variation in film thickness enables selective removal to expose depression bottoms, achieving precise depth adjustment while maintaining a relatively simple overall manufacturing process using standard deposition techniques.

Inventive Principle:

Principle #3Local quality

Data Source

PatentUS11931923B2Method of manufacturing template and method of forming pattern

Publication Date: 2024.03.19 KIOXIA CORP

AI summary

A method of manufacturing a template, has: preparing a substrate containing quartz and having a surface, the surface including a protrusion and a depression; and processing the depression. The processing of the depression includes: a first step of forming a film on the surface, the film including a first region and a second region, the first region being provided on the protrusion, and the second region being provided on a bottom of the depression and being thinner than the first region; a second step of removing the second region with the first region partly remaining to expose the bottom of the depression; and a third step of processing the exposed part of the depression using a mask made of the remainder of the first region.