Quartz Template Substrate with Impurity Implantation for Alignment Mark Visibility

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Solution Overview

Problem

In nanoimprint technology for semiconductor device manufacturing, the alignment marks on quartz templates are difficult to see due to similar refractive index and transmittance with the resist material, making precise alignment challenging.

Innovation Solution

A template substrate with impurity implantation regions containing a first and second impurity, where the first impurity has a higher ionization tendency and the second impurity has a larger atomic weight, is used to reduce transmittance and enhance contrast of alignment marks, allowing for improved visibility and accuracy during pattern transfer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a quartz template is used for nanoimprint technology, then the template maintains structural stability and durability, but the alignment marks become difficult to see due to similar refractive index and transmittance with the resist material

Engineering Contradiction:
Improvetemplate structural stabilityVSAvoidalignment mark visibility
Core Design Contradiction:
ReliabilityVSDifficulty of detecting and measuring

Solution Approach 1:

The patent applies local quality by creating impurity implantation regions with different optical properties at specific locations (alignment mark regions) on the template substrate. These localized regions have modified transmittance characteristics that differ from the surrounding quartz areas, enabling visual differentiation of alignment marks while preserving the overall structural integrity and stability of the quartz template.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent utilizes color changes (optical property changes) by implanting impurities that alter the transmittance and optical absorption characteristics of the alignment mark regions. This creates visual contrast between the alignment marks and the resist material, allowing for easy detection and measurement during the nanoimprint process while the quartz substrate maintains its mechanical stability.

Inventive Principle:
Principle #32Color changes

2Illumination intensity

If the transmittance of the template is high, then the template allows good light transmission for observation, but the alignment marks become indistinguishable from the resist material

Engineering Contradiction:
Improvelight transmissionVSAvoidalignment mark contrast
Core Design Contradiction:
Illumination intensityVSDifficulty of detecting and measuring

Solution Approach 1:

The patent creates localized impurity implantation regions that modify optical properties only where needed (at alignment mark locations). These regions have reduced transmittance compared to the surrounding high-transmittance quartz areas, creating visual contrast for alignment marks while preserving overall light transmission capability of the template for observation purposes.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent changes the transmittance parameter locally by implanting impurities with different optical absorption characteristics. This creates regions with modified transmittance values that provide sufficient contrast for alignment mark detection, while the majority of the template maintains high transmittance for adequate illumination and observation during the nanoimprint process.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of impurity implantation regions with specific properties effectively reduces transmittance and increases contrast, enabling high alignment accuracy and precise pattern transfer in nanoimprint technology.

Implementation Method 1

the refractive index and transmittance of quartz as a material of the template with respect to visible light are close to those of the resist with respect to visible light. Accordingly, there is a risk that the alignment mark becomes difficult to see

Methodology Applied
Scientific EffectOptical absorption: Absorption (EM radiation)

Data Source

PatentUS10459355B2Template substrate and manufacturing method thereof
Publication Date: 2019.10.29 KIOXIA CORP
  • US10459355B2 patent drawing
  • US10459355B2 patent drawing
  • US10459355B2 patent drawing

AI summary

A template substrate according to an embodiment includes a first face and a second face on an opposite side to the first face. A first region is located on the first face to be protruded from a peripheral portion thereof. A second region is located at least at an end portion of the first region, and is a region in which an alignment mark used at a time of transfer of a pattern is intended to be formed. The second region contains a first impurity and a second impurity.