Quartz Vibrator Etching for Independent Groove Depth Control
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Solution Overview
Problem
Existing methods for manufacturing quartz crystal vibrators restrict design freedom due to the collective formation of outer shapes and grooves using the micro loading effect in dry etching, limiting the ability to form grooves with different depths on multiple vibration arms.
Innovation Solution
A method involving multiple protective film formations and dry etching steps allows for the independent formation of grooves with varying depths on quartz crystal substrates, enabling the creation of vibrators with increased design flexibility and accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the outer shape and grooves are collectively formed by using the micro loading effect in dry etching, then the manufacturing process is simplified, but the design freedom is restricted and grooves with different depths cannot be formed on multiple vibration arms
Solution Approach 1:
The manufacturing process is divided into multiple discrete steps: first forming the outer shape of vibration arms through dry etching, then separately forming grooves on specific vibration arms through additional etching steps. This segmentation allows different groove depths to be created on different vibration arms while maintaining manufacturing efficiency through systematic process organization
Solution Approach 2:
The method applies different treatments to different vibration arms: some vibration arms receive groove formation while others do not, or grooves of different depths are created on different arms. This local differentiation enables customized detection sensitivity for each vibration arm based on its functional role in the vibrator assembly
2Measurement precision
If grooves of different depths are required on different vibration arms, then detection sensitivity can be optimized, but the manufacturing process becomes more complex
Solution Approach 1:
The outer shape of all vibration arms is formed first through dry etching before groove formation. This preliminary action establishes the base structure and allows subsequent groove etching to be performed selectively on specific vibration arms, optimizing detection sensitivity without requiring complete rework of the manufacturing process
Solution Approach 2:
The manufacturing process is made dynamic and adaptable: after forming the outer shape, the process can be configured to form grooves on one, two, three, or all four vibration arms depending on the desired detection sensitivity, allowing flexible optimization without fixed process constraints
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the detection sensitivity of angular velocity by allowing for deeper grooves on detection arms relative to drive arms, reducing thermoelastic loss and increasing the Q value, resulting in improved detection signals and sensitivity.
Implementation Method 1
a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first protective film; a second dry etching step of dry etching the quartz crystal substrate from the first surface through first protective film and the second protective film
Data Source
AI summary
A method for manufacturing a vibrator includes a preparation step of preparing a quartz crystal substrate having a first surface and a second surface which are in a front and back relationship, a first protective film formation step of forming a first protective film in a region of an element formation region other than a first groove formation region and a second groove formation region when a region of the quartz crystal substrate where the vibrator is formed is referred to as the element formation region, a region where the first groove is formed is referred to as the first groove formation region, and a region where the second groove is formed is referred to as the second groove formation region, a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first protective film, a second protective film formation step of forming a second protective film in the first groove formation region, and a second dry etching step of dry etching the quartz crystal substrate from the first surface through the first protective film and the second protective film.