Quartz Vibrator Groove Etching for Independent Depth Control
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Solution Overview
Problem
Existing methods for manufacturing quartz crystal vibrators restrict design freedom due to the collective formation of outer shapes and grooves using the micro loading effect in dry etching, limiting the ability to form grooves with different depths on vibration arms.
Innovation Solution
A method involving a preparation step, film formation, patterning, and dry etching of a quartz crystal substrate to form vibration arms with distinct groove depths, allowing for independent control of etching depths and enabling the formation of grooves with varying dimensions on the same substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the outer shape and grooves are collectively formed by using the micro loading effect in dry etching, then the processing can be completed in a single step, but the degree of freedom in design is low and grooves with different depths cannot be formed
Solution Approach 1:
The patent divides the etching process into multiple sequential steps: first forming the outer shape of the vibration arms, then forming grooves with different depths in subsequent steps. This segmentation allows independent control of each feature's dimensions, enabling design freedom while maintaining processing efficiency through systematic multi-step fabrication
Solution Approach 2:
The patent applies preliminary patterning to define regions where grooves will be formed, using protective films and masking layers to prepare the substrate before etching. This preliminary action enables precise control over groove depth and position, allowing different groove depths to be formed in different vibration arms while maintaining overall structural integrity
2Device complexity
If the outer shape and grooves are collectively formed by using the micro loading effect, then the number of processing steps is reduced, but the manufacturing precision of groove depths is restricted
Solution Approach 1:
The etching process is segmented into distinct stages: outer shape formation followed by groove formation in separate steps. Each step uses optimized etching parameters tailored to the specific feature being formed, enabling precise control of groove depths independent of the outer shape dimensions, thereby achieving high manufacturing precision
Solution Approach 2:
The patent uses selective protective films and masking layers that cover specific regions during etching, allowing grooves to be formed to different depths in different areas. This partial protection strategy enables precise depth control by exposing only the regions where deeper grooves are needed, achieving high manufacturing precision through selective etching
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances design flexibility and accuracy, increasing detection sensitivity by allowing for deeper grooves on detection arms relative to drive arms, thereby improving angular velocity detection capabilities.
Implementation Method 1
a first patterning step of patterning the first stacked body in a manner in which the first underlying film, the second underlying film, and the first protective film remain in a region of an element formation region other than a first groove formation region and a second groove formation region, the first underlying film and the second underlying film remain in the first groove formation region, and the first underlying film remains in the second groove formation region
Implementation Method 2
a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first stacked body
Data Source
AI summary
A method for manufacturing a vibrator includes a preparation step of preparing a quartz crystal substrate having a first surface and a second surface which are in a front and back relationship, a first film formation step of forming a first stacked body by sequentially stacking a first underlying film, a second underlying film, and a first protective film at the first surface, a first patterning step of patterning the first stacked body in a manner in which the first underlying film, the second underlying film, and the first protective film remain in a region of an element formation region other than a first groove formation region and a second groove formation region, the first underlying film and the second underlying film remain in the first groove formation region, and the first underlying film remains in the second groove formation region, and a first dry etching step of dry etching the quartz crystal substrate from the first surface through the first stacked body.