Quartz Window With Fluid Channels for Uniform Epitaxial Deposition

The heating function is segmented from the substrate support and process gas flow system, and integrated into the window structure itself. The window contains embedded heating elements and fluid channels that divide the heating function into discrete zones, allowing independent temperature control of different regions to achieve uniform process gas temperature across the substrate.

The window acts as an intermediary component between the heat source and the process gas. By embedding heating elements and fluid channels within the window structure, it serves as a mediator that distributes thermal energy uniformly across the process gas before it reaches the substrate, eliminating the non-uniform temperature distribution caused by conventional localized heating methods.

The window performs preliminary temperature conditioning of the process gas before it reaches the substrate. By pre-heating or cooling the gas uniformly across all zones through embedded fluid channels, the deposition process proceeds uniformly without requiring substrate rotation for compensation, thereby preventing precursor gas loss that would otherwise occur during rotation.

The mechanical substrate rotation system is replaced by a thermal field control system embedded in the window. Instead of mechanically rotating the substrate to achieve uniform deposition, the invention uses controlled thermal fields within the window to create uniform process gas temperature distribution, eliminating the need for rotation and its associated precursor gas loss.