Qubit Laser Annealing With Diffractive Beam Splitting

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Solution Overview

Problem

Laser annealing techniques for qubits face challenges due to microscale size and design constraints, requiring precise optical alignment that is difficult to achieve, and can damage superconducting leads if misaligned.

Innovation Solution

The use of a diffractive beam splitter to split a single optical beam into multiple Gaussian beams, which are projected onto the substrate around the Josephson junction, avoiding direct irradiation and allowing for uniform heating without precise alignment, thus minimizing damage and achieving consistent annealing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a single optical beam is used for laser annealing, then the annealing process is simple, but precise optical alignment is difficult to achieve and damage to superconducting leads occurs

Engineering Contradiction:
Improveease of alignmentVSAvoiddamage to superconducting leads
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The single optical beam is segmented into multiple beams (e.g., four beams) that are spatially separated and directed at different regions surrounding the Josephson junction. This segmentation allows each beam to be independently positioned, eliminating the need for precise alignment of a single beam while distributing the thermal load to avoid damage to superconducting leads.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces an intermediary optical element (such as a diffractive optical element or beam splitter) that transforms the single beam into multiple beams. This intermediary component facilitates the transition from a single-beam configuration requiring precise alignment to a multi-beam configuration with relaxed alignment requirements, while effectively delivering thermal energy to the target region.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Stability of the object's composition

If multiple optical beams are used for annealing, then uniform heating is achieved, but the device complexity increases

Engineering Contradiction:
Improveuniform temperature distributionVSAvoidoptical system complexity
Core Design Contradiction:
Stability of the object's compositionVSDevice complexity

Solution Approach 1:

The patent employs a universal optical component (such as a diffractive optical element or beam splitter) that simultaneously performs multiple functions: dividing the single beam into multiple beams, spatially separating the beams, and directing them toward the target region. This multi-functional component achieves uniform heating without requiring multiple separate optical systems, thereby limiting the increase in device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent changes the spatial distribution parameter of the optical beams by transforming a single concentrated beam into multiple spatially separated beams. This parameter change enables uniform temperature distribution across the target region while the use of standard optical components keeps the overall system complexity manageable.

Inventive Principle:
Principle #35Parameter changes

3Productivity

If direct laser irradiation is applied to the Josephson junction, then annealing efficiency is high, but the risk of damage increases

Engineering Contradiction:
Improveannealing efficiencyVSAvoiddamage risk to Josephson junction
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

Instead of directly irradiating the Josephson junction with the optical beam, the patent inverts the approach by directing multiple beams at regions surrounding the junction. The thermal energy diffuses from these surrounding regions into the junction, achieving annealing while avoiding direct laser-matter interaction that could cause damage.

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The patent converts the potential harm of direct laser irradiation into a beneficial indirect heating mechanism. By positioning beams to illuminate regions adjacent to the Josephson junction, the thermal diffusion process becomes the useful mechanism for annealing, while the avoidance of direct irradiation prevents localized overheating and damage.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method effectively adjusts the qubit's resonant frequency by indirectly heating the Josephson junction, reducing the risk of damage and ensuring uniform temperature distribution, even with minor laser misalignment, thereby improving qubit frequency control in quantum computing.

Implementation Method 1

generating the Gaussian beams via transmission of a laser generated Gaussian beam through a diffractive optical element

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 2

The plurality of optical beams indirectly heat the Josephson junction, resulting in the annealing of the Josephson junction

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Data Source

PatentUS20250107455A1Laser annealing of qubits using a diffractive beam splitter
Publication Date: 2025.03.27 INTERNATIONAL BUSINESS MACHINE CORPORATION
  • US20250107455A1 patent drawing
  • US20250107455A1 patent drawing
  • US20250107455A1 patent drawing

AI summary

Apparatuses and methods are described for laser annealing of a qubit device using a plurality of optical beams. According to an embodiment, a method of tuning a qubit device can comprise generating an optical beam, splitting the optical beam in a plurality of optical beams, and annealing a Josephson junction of the qubit device by projecting the plurality of optical beams onto a region of the qubit device adjacent to the Josephson junction. The disclosed techniques can also be applied for annealing other types of electrical components of various microscale integrated circuit devices.