Quencher Molecule Design for EUV Resist LWR Reduction
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Solution Overview
Problem
Current chemically amplified resist compositions face challenges in achieving low acid diffusion and high contrast simultaneously, which is crucial for forming ultrafine patterns in EUV and EB lithography, as existing amine quenchers fail to effectively control acid diffusion and improve contrast.
Innovation Solution
Incorporating a compound with a nitro-substituted aromatic group, a heterocyclic amine structure, and an acid labile group-substituted carboxy group as a quencher in the resist composition, which synergizes to control acid diffusion and enhance dissolution contrast, thereby reducing line width roughness (LWR) and critical dimension uniformity (CDU).
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional amine quenchers are used in chemically amplified resist compositions, then dissolution contrast is improved, but acid diffusion control ability is insufficient
Solution Approach 1:
The patent combines multiple functional groups within a single quencher molecule: nitro-substituted aromatic group (for acid diffusion control), heterocyclic amine structure (for acid neutralization), and acid labile group-substituted carboxy group (for dissolution contrast enhancement). This composite molecular structure simultaneously addresses both acid diffusion control and dissolution contrast improvement, resolving the technical contradiction between these two parameters.
Solution Approach 2:
The patent modifies the chemical parameters of the quencher by introducing specific functional groups with defined properties. The nitro-substituted aromatic group provides electron-withdrawing capability to control acid diffusion, while the heterocyclic amine structure provides base strength for acid neutralization, and the acid labile group-substituted carboxy group provides dissolution contrast. By changing these chemical parameters, the quencher achieves both acid diffusion control and high dissolution contrast.
2Manufacturing precision
If acid diffusion is reduced to improve resolution, then contrast is improved, but sensitivity is reduced
Solution Approach 1:
The patent creates local quality differences within the resist composition by positioning the nitro-substituted aromatic group to control acid diffusion locally around the exposure site, while the heterocyclic amine structure provides localized acid neutralization. The acid labile group-substituted carboxy group provides localized dissolution contrast enhancement. This local quality approach allows acid diffusion control without sacrificing overall sensitivity, as the acid generation and neutralization occur in a localized manner that preserves pattern definition while maintaining exposure efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution effectively reduces acid diffusion and improves contrast, leading to reduced LWR and enhanced CDU, particularly in positive resist compositions, while maintaining sensitivity and film thickness.
Implementation Method 1
Chemically amplified resist compositions comprising an acid generator capable of generating an acid upon exposure to light or EB
Implementation Method 2
a high acid diffusion control ability due to the synergy of nitro group and heterocyclic amine structure
Implementation Method 3
an improvement in dissolution contrast as a result of deprotection of the acid labile group
Data Source
AI summary
A resist composition comprising a quencher and an acid generator is provided. The quencher is a compound having a nitro-substituted aromatic group, a heterocyclic amine structure, and an acid labile group-substituted carboxy group in its molecule. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.