Quilting Data Processing Apparatus Fabric Deformation Visualization
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Solution Overview
Problem
Conventional quilting data processing apparatuses fail to display fabric deformation caused by sewing lines, making it difficult to visualize the finished state of quilting patterns.
Innovation Solution
A quilting data processing apparatus and computer program product that input fabric image data and sewing line data to create deformation mesh patterns, which are used to modify fabric image data and display the quilting pattern, allowing for the visualization of fabric changes and finished quilting states.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of information
If conventional quilting data processing apparatus displays only bright and dark portions formed by sewing lines, then the display process is simple, but fabric deformation cannot be displayed and finished state visualization is difficult
Solution Approach 1:
The fabric surface is divided into multiple mesh regions, with each mesh representing a small area that can be independently deformed. This segmentation allows the system to track and display fabric deformation by adjusting individual mesh coordinates based on sewing line position data, thereby preserving fabric deformation information without requiring complex continuous surface calculations.
Solution Approach 2:
A mesh pattern is introduced as an intermediary between the sewing line data and the fabric surface representation. The mesh pattern serves as a computational model that translates sewing line coordinates into fabric deformation visualizations, enabling the display of finished state images without directly complex fabric physics calculations.
2Loss of information
If deformation mesh pattern is created by deforming basic mesh pattern on basis of sewing line data, then fabric deformation can be displayed, but processing time and computational load increase
Solution Approach 1:
The basic mesh pattern is pre-divided into multiple small mesh regions before processing. This preliminary segmentation prepares the computational structure in advance, allowing rapid deformation calculations during the actual processing stage by simply adjusting mesh coordinates based on sewing line data, thereby reducing overall processing time.
Solution Approach 2:
The mesh pattern uses a finer division than strictly necessary for basic display, creating more mesh regions than minimal requirements. This excessive segmentation allows each individual mesh to be deformed with simple coordinate transformations, reducing the computational complexity per mesh and enabling faster overall processing despite the increased number of elements.
3Ease of operation
If deformation fabric image data is created by modifying fabric image data on basis of deformation mesh pattern, then finished state can be visualized, but data processing complexity increases
Solution Approach 1:
The deformation fabric image data is created by copying and transforming the basic fabric image data according to the deformation mesh pattern. Each mesh region's fabric image is copied and positioned according to the deformed mesh coordinates, allowing accurate finished state visualization through simple image copying and positioning operations rather than complex image generation.
Data Source
AI summary
The disclosure presents a quilting data processing apparatus and a program capable of displaying changes of fabric caused by a sewing line, and or easily displaying a visual image of a finished state of quilting. The CPU receives the fabric pattern of quilting, the thickness of fabric, the thickness of elastic material, and the sewing line of quilting, and, when the preview button is pressed, creates a basic mesh pattern, calculates the total deformation degree, deforms the basic mesh pattern sequentially along the sewing line to a deformation degree commensurate with the total deformation degree, and deforms each mesh adjacent to deformed meshes commensurately with the deformation degree, thereby creating a deformation mesh pattern (S1 to S5). Consequently, the CPU adheres to each mesh the fabric pattern displayed in a specified size in accordance with the deformation mesh pattern so as to create deformation fabric image data, overlaps the sewing line data to the upper side of the deformation fabric image data, and displays as a quilting pattern (S6 to S7).