Radial Gas Nozzle for Substrate Temperature Uniformity
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Solution Overview
Problem
Existing liquid treatment apparatuses face challenges in achieving uniform temperature distribution on substrates during processing, leading to variations in resist pattern line width and developing speed, due to inadequate cooling and heating control.
Innovation Solution
A nozzle unit with a radially discharging cooling gas nozzle that aligns its discharge region with the central portion of the substrate, combined with a control system that adjusts gas supply to improve temperature uniformity, while also incorporating a drying gas and treatment liquid nozzle for efficient processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If conventional cooling and heating control is used, then processing can be performed, but temperature distribution uniformity deteriorates leading to line width variations
Solution Approach 1:
The gas nozzle is positioned to discharge cooling gas specifically at the central portion of the substrate, creating a localized cooling zone. This local quality approach addresses the temperature uniformity issue by applying different thermal conditions to different regions of the substrate, with enhanced cooling at the center where temperature tends to be higher during liquid treatment processes
2Temperature
If gas supply is increased to improve cooling, then temperature uniformity improves, but processing time increases
Solution Approach 1:
Cooling gas is supplied during the liquid treatment process itself rather than as a separate pre-cooling or post-cooling step. This preliminary action integrates the cooling function into the existing processing timeline, allowing temperature control to occur concurrently with liquid treatment and thereby avoiding additional processing time
3Ease of manufacture
If conventional nozzle design is used, then结构简单性 is maintained, but cooling effectiveness deteriorates
Solution Approach 1:
The gas nozzle is positioned in the vertical dimension above the substrate surface, discharging cooling gas downward onto the central portion of the substrate. This spatial arrangement in the vertical dimension allows effective cooling without requiring complex lateral positioning mechanisms or multi-component assemblies, thereby maintaining structural simplicity while improving cooling effectiveness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances temperature uniformity across the substrate, reducing line width variations and improving processing efficiency by localized cooling and controlled gas supply strategies.
Implementation Method 1
A width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port
Data Source
AI summary
A nozzle unit for a liquid treatment apparatus that performs a liquid treatment on a substrate using a liquid, includes a first gas nozzle having a discharge flow path for allowing a first gas to flow through the discharge flow path and a first discharge port for discharging the first gas flowing through the discharge flow path toward a surface of the substrate, wherein the first discharge port is formed so as to extend in a first direction along the surface, and wherein a width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port.