Radiation-Sensitive Resin Composition for Uniform Acid Patterning
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Solution Overview
Problem
Existing photolithography technologies face challenges in forming high-aspect-ratio resist patterns with optimal sensitivity, Line Width Roughness (LWR) performance, Depth of Focus (DOF) performance, pattern rectangularity, Critical Dimension Uniformity (CDU) performance, and pattern circularity, particularly due to the use of perfluoroalkylsulfonic acid generators that are environmentally unfriendly.
Innovation Solution
A radiation-sensitive resin composition comprising an onium salt compound, a resin with an acid-dissociable group, and a solvent, which generates acids uniformly across the resist film, enhancing sensitivity, LWR, DOF, pattern rectangularity, CDU, and circularity, using a novel onium salt compound as a radiation-sensitive acid generator.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If perfluoroalkylsulfonic acid generators are used to improve sensitivity and resolution, then the photoacid generator can impart strong acidity, but the environmental unfriendliness worsens
Solution Approach 1:
The patent changes the chemical parameters of the photoacid generator by using partially fluorinated sulfonic acid generators instead of perfluoroalkylsulfonic acid generators. This parameter change maintains the necessary acidity for high resolution while reducing the environmental harm associated with complete fluorination, thus resolving the contradiction between resolution and environmental friendliness
Solution Approach 2:
The patent applies local quality by selectively fluorinating only the necessary portions of the sulfonic acid generator molecule rather than the entire molecule. This partial fluorination provides sufficient photoacidity for high resolution patterning while minimizing the environmental unfriendliness associated with extensive fluorination, thereby resolving the technical contradiction
2Length of moving object
If short-wavelength radioactive rays are used to promote pattern micronization, then the pattern size is reduced, but the sensitivity and uniformity of acid generation may be compromised
Solution Approach 1:
The patent changes the parameters of the photoacid generator to optimize its response to short-wavelength radiation. By selecting specific partially fluorinated sulfonic acid generators with appropriate molecular structures and acid dissociation constants, the patent achieves both small pattern dimensions and high sensitivity, resolving the contradiction between pattern size reduction and sensitivity maintenance
Solution Approach 2:
The patent employs a composite resist composition that includes the partially fluorinated sulfonic acid generator combined with specific resin components. This composite formulation enhances the overall sensitivity and uniformity of acid generation when exposed to short-wavelength radiation, while still achieving the desired pattern micronization, thus resolving the contradiction between pattern size and reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of high-quality resist patterns with improved sensitivity, LWR, DOF, pattern rectangularity, CDU, and circularity, even at high aspect ratios, by ensuring uniform acid distribution and mobility.
Implementation Method 1
generating an acid by irradiating the coating of the resist composition with a radioactive ray through a mask pattern
Implementation Method 2
reacting in the presence of the acid as a catalyst to generate the difference of solubility of a resin into an alkaline or organic developer between an exposed part and a non-exposed part
Data Source
AI summary
A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1), a resin including a structural unit which includes an acid-dissociable group, and a solvent. R1, R2, and R3 each independently represent a monovalent chain organic group having 1 to 10 carbon atoms; R4, R5, and R6 each independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; Rf1 represents a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 represents an integer of 0 to 8; m2 represents an integer of 1 to 4; and Z+ represents a monovalent radiation-sensitive onium cation.