Radiation-Sensitive Resin Composition with Spirolactone Structure
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Solution Overview
Problem
Current radiation-sensitive resin compositions for microfabrication with ArF excimer lasers lack sufficient development contrast and resolving performance due to limited polarity and acid dissociability, hindering the formation of high-resolution resist patterns.
Innovation Solution
A radiation-sensitive resin composition incorporating a polymer with structural units derived from compounds containing a spirolactone structure, combined with an acid generating agent and an organic solvent, which enhances polarity and acid dissociability, thereby improving resolving performance and development contrast.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a polymer with spirolactone structure is used, then development contrast is improved, but resolving performance is insufficient due to limited polarity and acid dissociability
Solution Approach 1:
The patent introduces a fluorinated alicyclic hydrocarbon group into the polymer structure, which changes the chemical parameters of the resin composition. This structural modification enhances both the polarity and acid dissociability of the polymer, thereby simultaneously improving resolving performance and development contrast without sacrificing either property
Solution Approach 2:
The patent creates a composite polymer structure by combining the spirolactone structural unit with the fluorinated alicyclic hydrocarbon group. This composite approach integrates the high development contrast benefit of spirolactone with the enhanced polarity and acid dissociability of the fluorinated alicyclic group, achieving both improved resolving performance and development contrast
2Manufacturing precision
If conventional polymers are used for ArF excimer laser lithography, then basic resist formation is achieved, but high-resolution pattern formation is hindered by insufficient polarity and acid dissociability
Solution Approach 1:
The patent modifies the chemical parameters of conventional polymers by incorporating fluorinated alicyclic hydrocarbon groups. This structural change increases the polarity and acid dissociability of the polymer, enabling the resin composition to achieve high-resolution resist pattern formation while maintaining adaptability for ArF excimer laser lithography applications
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves superior resolving performance, enabling the formation of high-resolution resist patterns with improved adhesiveness and etching resistance, facilitating further miniaturization in microfabrication.
Implementation Method 1
Chemically amplified radiation-sensitive resin compositions generate an acid upon irradiation with an electron beam or far ultraviolet ray typified by a KrF excimer laser or ArF excimer laser at a light-exposed site, and a chemical reaction that proceeds with the acid as a catalyst
Data Source
AI summary
A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.