Radiation Source Gas Conduit Layout for Window Contamination Control
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Solution Overview
Problem
Pulsed-discharge radiation sources in lithographic systems are prone to early failure due to contaminant particles accumulating in the gas chamber, which can contaminate optically sensitive components like the window, leading to unexpected failures.
Innovation Solution
A conduit system is introduced that includes a refill path and a conduit to manage the flow of gas within the radiation source. This system directs the flow of either a refill gas, the existing gas, or both during a refill operation to prevent contaminants from contacting the window, thereby extending the usable lifetime of the window.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If a pulsed-discharge radiation source is used to generate DUV radiation, then the radiation source can produce the desired wavelength for lithography, but contaminant particles accumulate in the gas chamber over time and cause early failure
Solution Approach 1:
The gas management system is segmented into multiple independent pathways: a refill path for introducing fresh gas and a separate exhaust path for removing contaminants. This segmentation allows the system to maintain continuous operation by periodically refreshing the gas without requiring complete system disassembly or shutdown, thereby extending source lifetime while maintaining radiation generation capability.
Solution Approach 2:
The system implements a gas refresh mechanism where contaminated gas is discarded through the exhaust path and replaced with fresh gas through the refill path. This discarding and recovering approach removes accumulated contaminant particles that would otherwise cause early failure, enabling the radiation source to maintain reliability over extended operational periods.
2Productivity
If the gas chamber operates continuously, then productivity is maintained, but contaminant particles accumulate and contaminate optically sensitive parts like the window
Solution Approach 1:
The gas management system operates continuously with parallel refill and exhaust paths, allowing the radiation source to maintain productivity without interruption. Fresh gas continuously flows through the chamber while contaminants are simultaneously removed, preventing accumulation that would otherwise require shutdown for maintenance and thereby eliminating the trade-off between continuous operation and contaminant control.
Solution Approach 2:
The conduit system acts as an intermediary between the gas chamber and the external environment, providing dedicated pathways for gas intake and exhaust. This intermediary structure enables continuous operation by mediating the removal of harmful contaminants through the exhaust path while maintaining the radiation generation process uninterrupted through the refill path.
3Device complexity
If no gas management system is implemented, then the device complexity is low, but the window is exposed to contaminants and fails prematurely
Solution Approach 1:
The gas management system provides self-service functionality by automatically refreshing the gas chamber environment without requiring external intervention or complex control mechanisms. The refill and exhaust paths work passively to maintain a clean gas environment, protecting the window from contaminants while adding minimal complexity to the overall system structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The conduit system effectively reduces the likelihood of untimely failure of the pulsed-discharge radiation source by preventing contaminants from reaching the window, thus enhancing the operational reliability and extending the lifespan of the radiation source.
Implementation Method 1
Pulsed-discharge radiation sources excite gas molecules confined in a chamber to generate laser radiation of a desired wavelength. The gas molecules can be excited by supplying a voltage (e.g., an electrical pulse) to the gas via electrodes.
Implementation Method 2
The conduit system is configured to direct a flow of one of a refill gas, the gas, or the refill gas and the gas at least during a refill operation to prevent the contaminant from contacting the window
Data Source
AI summary
A pulsed-discharge radiation source includes a gas chamber, a window, and a conduit system. The conduit system includes a refill path and a conduit. The pulsed-discharge radiation source generates radiation. The gas chamber confines a gas and contaminants produced during the generation of radiation. The window isolates the gas from an environment external to the gas chamber and allows the radiation to travel between the gas chamber and the environment. The refill path allows a replacement of the gas. The conduit circulates the gas to or from the gas chamber during the generating. The conduit system directs a flow of one of a refill gas, the gas, or the refill gas and the gas at least during a refill operation to prevent the contaminant from contacting the window, whereby the conduit system increases the usable lifetime of at least the window.