Raised-Section Susceptor for CVD Deposition Control
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Solution Overview
Problem
Errant deposition in CVD reactors leads to degradation of HTS films due to build-up on susceptor surfaces, causing non-uniformity and performance issues, and necessitates frequent reactor cleaning, limiting continuous processing of long HTS tapes.
Innovation Solution
A susceptor design with raised sections and channels to collect errant deposition, combined with support ridges to elevate the substrate tape and minimize contact, ensuring even heat distribution and preventing deposition on susceptor surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a heated susceptor is used in a CVD process, then the substrate tape can be heated to high temperature for HTS film growth, but errant deposition builds up on the exposed surfaces of the susceptor and other reactor components
Solution Approach 1:
The susceptor is divided into multiple sections: a main body portion and multiple raised sections. The raised sections are positioned to contact the substrate tape while the gaps between them prevent errant deposition from accumulating on the susceptor surfaces, segmenting the susceptor functionality to address both heating and deposition control
Solution Approach 2:
The harmful function of the susceptor surface (where errant deposition accumulates) is separated from the useful function (heating the substrate). By extracting the exposed susceptor surface from the deposition zone and replacing it with raised sections that minimize exposure, the harmful deposition effect is removed while preserving the heating capability
2Temperature
If errant deposition builds up on susceptor surfaces near the tape edges, then the heat transfer and radiation properties change causing local edge temperature non-uniformity, but this degrades the HTS film properties
Solution Approach 1:
The raised sections are positioned to contact the substrate tape at multiple locations including near the edges, ensuring uniform heat distribution while the gaps between raised sections prevent errant deposition from affecting the edge regions, thereby maintaining both temperature uniformity and film quality
3Productivity
If continuous processing of long HTS tapes is desired, then productivity increases, but frequent reactor cleaning is required due to errant deposition buildup
Solution Approach 1:
The segmented susceptor design with gaps between raised sections prevents errant deposition from accumulating on the susceptor surfaces, eliminating the need for frequent reactor cleaning and enabling continuous processing of long HTS tapes without interruption
Solution Approach 2:
By removing the exposed susceptor surfaces that cause errant deposition buildup, the harmful effect requiring periodic cleaning is eliminated, allowing continuous operation and maximizing productivity without time loss to maintenance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents errant deposition on susceptor surfaces, maintaining film quality and enabling continuous processing of long HTS tapes by minimizing film degradation and reducing the need for reactor cleaning.
Implementation Method 1
hot block susceptors that directly contact the substrate tape and provide the needed heat via conduction
Implementation Method 2
errant deposition occurs and builds up on the exposed surfaces of the susceptor
Data Source
AI summary
A susceptor used in a deposition reactor provides heat input and controls the build-up of errant deposition. The susceptor heats a substrate tape within the reactor upon which one or more thin films are deposited, particularly high temperature superconductor (HTS) thin films produced in a MOCVD reactor.