Raman Metrology for Patterned Structures With Higher Sensitivity
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Solution Overview
Problem
Existing metrology techniques struggle to meet the stringent sensitivity and throughput requirements for controlling the manufacture of patterned structures, particularly in semiconductor process control, where material properties like composition, stress, and doping are critical.
Innovation Solution
The use of Raman spectroscopy at specific measurement configurations, combined with suitable modeling capabilities, to optimize the measurement of structure parameters. This approach involves controlling illumination and collection channels, and processing the Raman spectra to isolate sensitivity to specific material parameters.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If conventional optical measurement techniques are used to measure stress and material properties, then measurement capability is provided, but sensitivity and throughput requirements for semiconductor process control are not met
Solution Approach 1:
The patent applies parameter changes by systematically varying illumination and collection angles, polarizations, and wavelengths in Raman spectroscopy measurements. This enables optimization of sensitivity to specific material parameters (composition, stress, doping) while maintaining high throughput through automated parameter scanning and efficient data acquisition protocols.
Solution Approach 2:
The patent introduces additional measurement dimensions by implementing multi-angle illumination and collection geometries, as well as multiple polarization states. This dimensional expansion allows simultaneous extraction of multiple material properties from a single measurement setup, thereby improving sensitivity without proportionally increasing measurement time.
2Adaptability or versatility
If multiple material properties (composition, stress, doping) are measured simultaneously, then comprehensive process control is achieved, but measurement complexity increases
Solution Approach 1:
The patent implements universality by designing a single Raman spectroscopy platform that can measure multiple material properties (composition, stress, doping) simultaneously through configurable illumination and collection parameters. This multi-functional approach eliminates the need for separate measurement systems for each property, reducing overall system complexity while maintaining comprehensive measurement capability.
Solution Approach 2:
The patent applies local quality by optimizing specific measurement parameters (illumination angle, collection angle, polarization) for each target property (composition, stress, doping). This localized parameter optimization allows the system to selectively enhance sensitivity to specific material properties while maintaining a unified measurement platform, thereby managing complexity through targeted parameter control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables accurate and efficient measurement of multiple properties in patterned structures, including material composition, stress, and doping, thereby improving process control in semiconductor manufacturing.
Implementation Method 1
Raman spectroscopy is an established technology, with extensive literature describing its usage for the characterization of various material properties
Implementation Method 2
One system includes an optical subsystem configured to measure stress-induced birefringence in patterned structures formed on the specimen
Data Source
AI summary
A method for use in measuring one or more characteristics of patterned structures, the method including providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the one or more characteristics to be measured, processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme, and analyzing the distribution of Raman-contribution efficiency and determining the one or more characteristics of the structure.