Ramped Gate Erase for Dual Bit Flash Memory

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Solution Overview

Problem

Flash memory devices face challenges with long programming and erasing times, over-erasing issues, and increased power consumption, particularly due to the interdependency of complementary bits which can lead to errors and reduced device reliability as the channel length decreases.

Innovation Solution

A ramped voltage gate erasure technique is employed, starting with a lower initial voltage and incrementally increasing it to efficiently erase dual bit flash memory sectors with fewer pulses, reducing power consumption and improving reliability over traditional fixed voltage methods.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Loss of time

If traditional fixed voltage erase method is used, then erase operation can be performed, but the number of pulses required is large and power consumption is high

Engineering Contradiction:
Improveerase timeVSAvoidpower consumption
Core Design Contradiction:
Loss of timeVSUse of energy by moving object

Solution Approach 1:

The patent applies dynamics by transitioning from a static fixed voltage erase method to a dynamic ramped voltage method. The control gate voltage is gradually increased from an initial lower voltage to a final higher voltage over multiple pulses, allowing the erase operation to adapt to the memory cell's erasure progress and reduce both time and power consumption.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent changes the voltage parameter dynamically during the erase operation. Instead of applying a constant high voltage, the control gate voltage is ramped up incrementally across multiple pulses, optimizing the balance between erase effectiveness, speed, and power consumption.

Inventive Principle:
Principle #35Parameter changes

2Quantity of substance

If channel length is decreased to increase storage density, then packing density improves, but complementary bit interdependency increases causing errors

Engineering Contradiction:
Improvestorage densityVSAvoiddevice reliability
Core Design Contradiction:
Quantity of substanceVSReliability

Solution Approach 1:

The patent applies local quality by selectively applying different voltage levels to different regions of the memory array during erase operations. By using wordline-selective ramped voltage erasure, only specific blocks or sectors are erased at a time with optimized voltage profiles, reducing the impact of complementary bit interdependency while maintaining high storage density.

Inventive Principle:
Principle #3Local quality

3Reliability

If more erase pulses are applied to ensure complete erasure, then erasure completeness improves, but over-erasing occurs and device reliability decreases

Engineering Contradiction:
Improveerasure completenessVSAvoidover-erasing
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent implements feedback by incorporating verification steps between erase pulses. The memory cells are periodically checked to determine if erasure is complete, and the ramped voltage process is adjusted or terminated based on this feedback, preventing over-erasing while ensuring complete erasure when needed.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The dynamic ramped voltage approach allows the erase process to adapt to the actual erasure progress of each memory cell, applying just the right amount of voltage to achieve complete erasure without excessive voltage application that would cause over-erasing and reliability degradation.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The ramped voltage gate erasure technique significantly reduces the number of pulses required to erase memory cells, enhances reliability, and decreases power usage, maintaining efficiency even after device cycling, compared to conventional fixed voltage techniques.

Implementation Method 1

In order to erase a typical single bit, stacked gate, flash memory cell, a relatively high voltage is applied to the source (e.g., +5 volts), and the control gate is held at a high negative potential (e.g., −10 volts), while the drain is allowed to float. Under these conditions, a strong electric field is developed across the tunnel oxide between the floating gate and the source. The electrons that are trapped in the floating gate flow are forced into the source region by way of Fowler-Nordheim tunneling through the tunnel oxide.

Methodology Applied
Scientific EffectFowler-Nordheim tunneling:

Data Source

PatentUS20080037330A1Ramp gate erase for dual bit flash memory
Publication Date: 2008.02.14 ARRAYCOMM INC
  • US20080037330A1 patent drawing
  • US20080037330A1 patent drawing
  • US20080037330A1 patent drawing

AI summary

A method of erasing a block of flash memory cells by applying a ramped gate erase voltage to the block of memory cells. When an erase verify of the block of memory cells indicates that erasure has not been successfully completed another erase voltage with a greater absolute value than the initial erase voltage can be applied to the block of memory cells until erasure is complete.