Random Pattern Design for Moiré Elimination in Optical Substrates

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Solution Overview

Problem

The existing methods for avoiding moiré patterns in display equipment, such as CRTs and LCDs, are inefficient and difficult to implement universally, as they require specific angle alignments and are not effective in removing moiré patterns completely, especially in 3D image displays using lenticular plates.

Innovation Solution

A method of designing a random pattern by setting unit valid pattern regions, forming random points, and connecting them in specific directions to create a pattern that eliminates moiré phenomena regardless of avoidance angles and pitches, applicable to various optical equipment substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If specific angle alignments are used to avoid moiré patterns, then moiré phenomenon can be reduced in some cases, but the solution is not universally applicable and cannot completely remove moiré patterns

Engineering Contradiction:
Improvemoiré phenomenonVSAvoiduniversal applicability
Core Design Contradiction:
Object-affected harmful factorsVSAdaptability or versatility

Solution Approach 1:

The patent applies asymmetry by using irregular, non-periodic patterns instead of symmetric lattice patterns. The first and second patterns both use irregular shapes with varying sizes and positions, preventing the formation of regular interference patterns that cause moiré effects. This asymmetric design breaks the periodicity required for moiré phenomenon while maintaining visual functionality.

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent changes the fundamental parameters of the pattern design from regular lattice structures to irregular patterns with randomised parameters including position, size, and shape. By varying these parameters across the pattern while maintaining overall density and distribution, the solution achieves universal applicability across different viewing angles and distances without relying on specific angle alignments.

Inventive Principle:
Principle #35Parameter changes

2Stability of the object's composition

If lattice patterns are used in optical substrates, then structural regularity is achieved, but moiré patterns are generated when substrates are superimposed

Engineering Contradiction:
Improvestructural regularityVSAvoidmoiré pattern generation
Core Design Contradiction:
Stability of the object's compositionVSObject-affected harmful factors

Solution Approach 1:

The patent replaces symmetric lattice patterns with asymmetric irregular patterns. Both the first and second patterns consist of irregular shapes with non-uniform sizes and positions, eliminating the periodic structure that causes moiré interference when substrates are superimposed. The irregularity maintains sufficient structural consistency for functionality while preventing harmful interference patterns.

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent uses two different irregular patterns (first and second patterns) that both achieve moiré avoidance but with different configurations. These can be copied and applied to different optical substrates depending on specific application requirements, providing flexibility while maintaining the core principle of irregular pattern design to eliminate moiré effects.

Inventive Principle:
Principle #26Copying

3Ease of manufacture

If regular patterns are superimposed on display equipment, then manufacturing is simplified, but moiré phenomenon inevitably occurs

Engineering Contradiction:
Improvepattern manufacturingVSAvoidmoiré phenomenon
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The patent employs asymmetric irregular patterns that, while more complex in design than regular lattices, can be manufactured using modern digital printing and patterning techniques. The irregular patterns are defined by digital data that can be directly transferred to substrates, making the manufacturing process manageable despite the increased pattern complexity compared to traditional regular lattices.

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent changes from fixed regular pattern parameters to variable irregular parameters that can be controlled through digital design and manufacturing processes. By using computational methods to generate and reproduce the irregular patterns with consistent statistical properties, the manufacturing complexity is managed while achieving the goal of moiré elimination.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentEP2743764B1Method of designing random pattern and apparatus for designing random pattern
Publication Date: 2021.07.21 LG INNOTEK CO LTD
  • EP2743764B1 patent drawingFigure 1
  • EP2743764B1 patent drawingFigure 2
  • EP2743764B1 patent drawingFigure 3~4

AI summary

Disclosed are a method of designing a random pattern to be used for forming a conductive mesh pattern, an apparatus for designing the random pattern and an optical substrate including the conductive mesh pattern based on the random pattern according to the same method. The method includes the steps of dividing a pattern design region in a plurality of unit regions; setting at least one point having random coordinates within each unit region; and connecting each point within each unit region to other points lying within adjacent unit regions in a first direction or a second direction.