Random Polygon Test Patterns for OPC Calibration
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Solution Overview
Problem
Current test patterns used in semiconductor devices, such as line-and-space type patterns, are insufficient for verifying the validity of optical proximity effect correction methods due to their simplicity, leading to increased error rates in photolithography processes for complex circuit patterns.
Innovation Solution
A method of generating test patterns using combinations of randomly disposed polygons with various shapes, including vertical and horizontal bar shapes, which are randomly positioned and merged or separated within set spaces, allowing for complex composite patterns to optimize photolithography processes and reduce errors in optical proximity effect correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If simple line-and-space type patterns are used for testing, then the test process is simple and fast, but the measurement precision and reliability of optical proximity effect correction verification deteriorate
Solution Approach 1:
The patent changes the geometric parameters of test patterns from simple line-and-space structures to complex polygon combinations with varied shapes, sizes, and orientations. This parameter transformation enables the test patterns to better represent actual circuit complexities while maintaining automated generation efficiency through random function-based polygon placement algorithms.
Solution Approach 2:
The patent creates composite test patterns by combining multiple polygons with different geometric properties (rectangles, triangles, trapezoids) in various configurations. These composite patterns simulate the diversity of actual circuit geometries more effectively than homogeneous line-and-space patterns, thereby improving verification accuracy without sacrificing generation efficiency.
2Measurement precision
If complex circuit patterns are used for testing, then the measurement precision of optical proximity effect correction improves, but the device complexity and manufacturing difficulty increase
Solution Approach 1:
The patent segments complex test patterns into individual polygon elements that can be independently generated and positioned using random functions. Each polygon is a simple geometric shape, but their random combinations create complex overall patterns. This segmentation approach allows automated generation of complex patterns without manual design complexity.
Solution Approach 2:
The patent implements self-service by using random functions to automatically generate and position polygon combinations without requiring manual design intervention. The system autonomously creates diverse complex patterns that adapt to testing requirements, eliminating the need for expert designers to manually craft complex test structures while maintaining high verification accuracy.
3Adaptability or versatility
If diverse polygon combinations are generated randomly, then the adaptability of test patterns to various circuit configurations improves, but the device complexity of the generation system increases
Solution Approach 1:
The patent achieves universality by designing a random function-based generation system that can produce multiple polygon types (rectangles, triangles, trapezoids) with varying sizes, orientations, and positions using the same core algorithmic framework. This single unified system replaces the need for multiple specialized pattern generation tools, thereby improving adaptability without proportionally increasing system complexity.
Data Source
AI summary
Provided is a method of generating test patterns. The method includes generating a first polygon, disposing the first polygon in a pattern region, selecting one region from peripheral regions of the first polygon, generating a second polygon, disposing the second polygon in the selected region, and repeating the above processes.