Rare Gas Regeneration Control in Substrate Processing Chambers
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Solution Overview
Problem
The high cost and difficulty in obtaining rare gases like krypton (Kr) and xenon (Xe) for semiconductor etching processes due to their scarcity and expensive synthesis, leading to increased initial and maintenance costs for gas regenerators.
Innovation Solution
A substrate processing apparatus and method that selectively guides emission gas to a rare gas regenerator only during processing steps where the rare gas utilization rate exceeds a predetermined standard, allowing for efficient recovery and reuse of rare gases while minimizing unnecessary operation of the gas regenerator.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of substance
If a gas regenerator is used to separate and recover rare gas from discharged etching gas, then rare gas can be reused, but the initial cost and maintenance cost increase significantly
Solution Approach 1:
The invention changes the operational parameters of the gas regenerator by controlling when it operates (only during specific processing steps where rare gas is used) rather than running continuously. This parameter change allows the system to achieve rare gas recovery while reducing unnecessary operational costs and maintenance requirements.
Solution Approach 2:
The gas regenerator's operation is made dynamic rather than static - it is selectively activated only during processing steps that use rare gas, and remains inactive during other steps. This dynamic operation reduces the cumulative maintenance burden and initial cost justification while maintaining effective rare gas recovery when needed.
2Loss of substance
If a large gas regenerator is used to handle all emission gas, then all rare gas can be recovered, but the maintenance cost and complexity increase
Solution Approach 1:
Instead of processing all emission gas through the regenerator continuously, the system applies partial action by selectively processing only the portions of emission gas that contain rare gas. This reduces the overall burden on the gas regenerator, allowing for a smaller, less complex system that still achieves effective rare gas recovery.
Solution Approach 2:
The emission gas processing is segmented into different time periods corresponding to different processing steps. The gas regenerator is activated only during segments where rare gas is being used, rather than operating continuously on all emission gas. This segmentation reduces the required capacity and complexity of the gas regenerator system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the power consumption and maintenance costs of the gas regenerator by operating it only during high utilization rate steps, while still achieving significant rare gas recovery and reuse, thus lowering the overall cost of rare gas usage.
Implementation Method 1
a gas regenerator is used to separate rare gas from gas discharged from an etching chamber
Implementation Method 2
the rare gas is recovered and then reused
Data Source
AI summary
According to one embodiment, there is provided a gas regeneration method. The method includes setting a predetermined standard on a basis of a flow rate of rare gas set in a processing recipe. The method includes selecting a rare gas recovery step on a basis of the predetermined standard. The method includes, in the rare gas recovery step, guiding emission gas from a predetermined chamber to a rare gas regenerator. The method includes, in a step other than the rare gas recovery step, causing the emission gas to bypass the rare gas regenerator to discharge the emission gas.