Rasterized Primitive Library for Lithography Data Path
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Solution Overview
Problem
Conventional lithographic apparatuses face inefficiencies in data-path processing due to the need for quick calculations and large data volumes when converting vector-based representations to rasterized representations, particularly in maskless systems where patterns require varying resolutions and extensive data processing, leading to increased costs and reduced throughput.
Innovation Solution
The method involves converting a vector-based representation of a desired device pattern to a rasterized representation by forming rasterized primitives from primitive data and storing them with instance data, allowing for efficient data processing and storage, and using a data processing system with multiple processing units to handle different portions of the substrate aligned parallel to the scanning direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If complex calculations and large data volumes are processed in real time to convert vector-based representation to control signals, then the quality and accuracy of the lithographic pattern is improved, but the cost of processing hardware increases and throughput is reduced
Solution Approach 1:
The patent pre-calculates and stores rasterized representations of primitive patterns (such as lines, circles, and polygons) in a library before the actual lithographic exposure process. During exposure, the system retrieves and reuses these pre-computed rasterized primitives instead of performing complex real-time calculations, thereby maintaining pattern accuracy while significantly improving throughput and reducing hardware costs
Solution Approach 2:
The patent divides complex device patterns into simpler primitive patterns (basic geometric shapes). Each primitive is independently rasterized and stored in a library. During exposure, the system assembles the final pattern by retrieving and combining these pre-rasterized primitives according to the vector-based design data, reducing computational complexity while maintaining precision
2Quantity of substance
If vector-based representation with hierarchy is used to keep data size small, then data storage efficiency is improved, but processing speed is reduced due to the need to remove hierarchy
Solution Approach 1:
The patent pre-processes the hierarchical vector-based data by rasterizing primitive patterns and storing them in a library with instance data that preserves the hierarchical structure. During exposure, the system directly retrieves and assembles these pre-rasterized primitives using the instance data, eliminating the need for time-consuming hierarchy removal while maintaining data compactness
Solution Approach 2:
The patent creates a library of rasterized primitive patterns that can be copied and reused multiple times. The hierarchical structure is preserved through instance data that references these copies rather than duplicating full pattern data, maintaining both data efficiency and processing speed
Data Source
AI summary
A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation includes primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.