RDL Adhesion Layer Layout for TIV-Induced Delamination
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Delamination between redistribution layers (RDLs) and polymer layers in semiconductor device packages occurs due to thermal expansion of through insulator vias, leading to electrical shorting and reduced yield.
Innovation Solution
Incorporation of an adhesion layer over portions of the RDLs in the shadow of through insulator vias to enhance adhesion between RDLs and polymer layers, reducing the likelihood of delamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If through insulator vias are formed in the redistribution structure, then electrical connectivity is achieved, but thermal expansion causes delamination between RDLs and polymer layers
Solution Approach 1:
An adhesion layer is introduced as an intermediary between the RDL and polymer layer. This adhesion layer specifically addresses the interface where delamination occurs due to thermal expansion of through insulator vias, maintaining both electrical connectivity and structural stability.
Solution Approach 2:
The adhesion layer is applied selectively to specific regions rather than uniformly across the entire structure. This localized application targets areas prone to delamination while minimizing additional complexity and material usage.
2Reliability
If adhesion layer is added to prevent delamination, then reliability is improved, but device complexity increases
Solution Approach 1:
The adhesion layer is applied selectively to specific regions rather than uniformly across the entire structure. This localized application targets areas prone to delamination while minimizing additional complexity and material usage.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces the likelihood of electrical shorting and increases semiconductor device package yield by preventing delamination caused by thermal stress.
Implementation Method 1
Delamination between redistribution layers (RDLs) and polymer layers in semiconductor device packages occurs due to thermal expansion of through insulator vias
Data Source
AI summary
An adhesion layer may be formed over portions of a redistribution layer (RDL) in a redistribution structure of a semiconductor device package. The portions of the RDL over which the adhesion layer is formed may be located in the “shadow” of (e.g., the areas under and/or over and within the perimeter of) one or more TIVs that are connected with the redistribution layer structure. The adhesion layer, along with a seed layer on which the portions of the RDL are formed, encapsulate the portions of the RDL in the shadow of the one or more TIVs, which promotes and/or increases adhesion between the portions of the RDL and the polymer layers of the redistribution structure.


