Reaction Chamber Parameter Matching for Consistent Process Results
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Solution Overview
Problem
The complexity of matching process results among multiple reaction chambers in semiconductor equipment due to slight differences in hardware structures and installation errors, leading to difficulties in adjustment and requiring significant time, manpower, and resources.
Innovation Solution
A method and apparatus that select and adjust processing factors such as RF power and process gas flow by setting adjustment coefficients to ensure the real values match target values within a preset accuracy range, using linear or non-linear fitting methods to achieve consistent process results across multiple reaction chambers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If hardware structures and components are adjusted to match multiple reaction chambers, then matching precision is improved, but device complexity and adjustment difficulty increase
Solution Approach 1:
The patent changes the adjustment parameters from hardware structure parameters to process parameter parameters. By adjusting process parameters (temperature, pressure, gas flow, power) instead of hardware structures, the system achieves matching precision while avoiding the complexity of hardware adjustment. The control device adjusts process parameters based on the difference between actual and target values to make multiple reaction chambers produce consistent results.
2Manufacturing precision
If process testing and adjustment are performed repeatedly to achieve matching, then matching precision is improved, but time consumption and resource usage increase
Solution Approach 1:
The system performs preliminary characterization of each reaction chamber to obtain baseline process parameters before actual production. The control device stores these baseline parameters and uses them to calculate appropriate process parameters for each chamber, eliminating the need for repeated testing and adjustment during production. This preliminary action significantly reduces time consumption while maintaining matching precision.
Solution Approach 2:
The control device continuously monitors the actual process parameters and compares them with target values, then automatically adjusts the parameters to maintain matching precision. This closed-loop feedback control eliminates the need for manual repeated testing and adjustment, reducing both time consumption and resource usage while maintaining high matching precision.
3Manufacturing precision
If hardware assembly accuracy is improved to reduce differences among chambers, then matching precision is improved, but manufacturing complexity and cost increase
Solution Approach 1:
The patent replaces mechanical hardware adjustment with electronic/control system adjustment. Instead of precisely assembling and adjusting hardware components to achieve matching, the system uses a control device to adjust process parameters electronically. This substitution dramatically simplifies manufacturing and assembly while maintaining or improving matching precision through software-based parameter optimization.
Data Source
AI summary
A matching method for multiple reaction chambers includes selecting at least one factor, setting an adjustment coefficient for the factor corresponding to each of the reaction chambers, and obtaining an input value of the factor to enter into each reaction chamber based on the target value of the factor and the adjustment coefficient corresponding to each of the reaction chambers. The processing factor has a target value and a real value corresponding to each of the reaction chamber. The adjustment coefficient is based on the real value and the target value of the factor being within a preset accuracy range when the corresponding chamber operates a process.