Stop-Gapped Reaction Chamber Seal for Particle-Safe Vacuum Control
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Solution Overview
Problem
Current nano-fabrication techniques face challenges in achieving larger production yields and increasing circuits per unit area on substrates, while maintaining process control and reducing feature dimensions.
Innovation Solution
A reaction chamber design with an adjustable gap and stops to minimize contact area, combined with vacuum ports for gas flow management, to enhance process control and reduce particle contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the reaction chamber walls are made to contact each other to form a seal, then vacuum sealing is achieved, but particle contamination increases due to larger contact area
Solution Approach 1:
The patent applies local quality by creating a vacuum seal at specific localized points rather than along an extended contact surface. The vacuum seal is formed at discrete locations where the movable wall contacts the stationary wall, concentrating the sealing function in specific zones while maintaining minimal overall contact area between the chamber walls.
2Reliability
If the gap between chamber walls is reduced to improve sealing, then vacuum sealing improves, but particle contamination increases due to closer proximity
Solution Approach 1:
The patent segments the sealing function by providing multiple discrete vacuum seal locations around the chamber periphery rather than relying on a single continuous seal. This segmentation allows the chamber to achieve effective vacuum sealing through multiple small contact points, thereby maintaining a larger average gap between walls while still preventing leaks.
3Reliability
If enclosing members contact each other to form a closed chamber, then chamber sealing is achieved, but particle generation increases from contact surfaces
Solution Approach 1:
The patent applies local quality by concentrating the sealing function at specific localized contact regions rather than along extended surfaces. The movable enclosing member contacts the stationary enclosing member only at defined peripheral locations to form vacuum seals, minimizing the total contact area and thereby reducing particle generation from friction and wear.
4Ease of operation
If the reaction chamber is designed with movable walls for substrate access, then ease of operation improves, but particle contamination risk increases from wall contact
Solution Approach 1:
The patent applies local quality by restricting wall contact to specific localized regions at the chamber periphery where vacuum seals are formed. The movable wall maintains a gap from the stationary wall during substrate access operations, contacting only at discrete seal locations, thereby enabling ease of operation while minimizing particle contamination from extended contact surfaces.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The reaction chamber design improves process control and reduces particle contamination, enabling more efficient nano-fabrication processes with increased yields and smaller feature dimensions.
Implementation Method 1
one or more vacuum ports in the first gap surface or the second gap surface
Data Source
AI summary
Some devices and systems comprise one or more walls of a reaction chamber; an adjustable gap in the one or more walls, wherein the adjustable gap is formed between a first gap surface and a second gap surface facing the first gap surface, and wherein a distance between the first gap surface and the second gap surface is adjustable; a plurality of stops, wherein each stop of the plurality of stops is positioned on either the first gap surface or the second gap surface, wherein the plurality of stops ensure a minimum distance of the adjustable gap, wherein a total length of the plurality of stops is less than 1% of a length of the first gap surface; and one or more vacuum ports in the first gap surface or the second gap surface.