Reaction Gas Tank Outlet Geometry for Uniform ALD Supply
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Solution Overview
Problem
Existing semiconductor processing methods face challenges in forming uniform layers with good step coverage on complex three-dimensional structures using reaction gases, leading to increased reaction gas usage and byproduct generation, which can clog exhaust lines and disrupt production.
Innovation Solution
A reaction gas supply system with a reduced volume tank (0.16-0.24 liters) and controlled pressure, combined with features like conical outlets, spiral flow, and smaller dimensions, to enhance gas pressure and reduce gas usage, minimizing byproduct formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of moving object
If a conventional large volume tank is used to store reaction gas, then the gas supply duration is extended, but the tank size and space occupation increase
Solution Approach 1:
The patent changes the physical parameters of the tank by reducing its volume from conventional large sizes to a specific small range (0.16-0.24 liters) and optimizing the outlet portion geometry. This parameter optimization allows the tank to provide sufficient gas supply duration for ALD processes while minimizing space occupation and improving system compactness.
2Volume of stationary object
If the tank volume is reduced to minimize space occupation, then the tank size decreases, but the gas supply duration may be insufficient
Solution Approach 1:
The patent applies preliminary action by pre-optimizing the outlet portion design with gradually decreased diameters and spiral flow patterns before gas supply begins. These pre-configured flow paths ensure that even with reduced tank volume, the reaction gas flows efficiently to the reaction chamber, maintaining adequate supply duration for complete ALD cycle execution.
Solution Approach 2:
The patent optimizes the outlet portion parameters including diameter gradients and spiral flow characteristics to maximize gas flow efficiency. By carefully controlling these geometric parameters, the system achieves both compact tank volume (0.16-0.24 liters) and sufficient gas supply duration for complete ALD processes.
3Ease of manufacture
If the outlet portion has uniform diameter to simplify manufacturing, then the structure is easier to produce, but gas flow efficiency and pressure distribution are reduced
Solution Approach 1:
The patent applies local quality by creating non-uniform diameter distribution in the outlet portion, where diameters gradually decrease from the tank connection toward the reaction chamber. This localized geometric variation optimizes gas flow distribution and pressure gradients in critical regions, improving gas flow efficiency and step coverage while remaining manufacturable through standard machining processes.
Solution Approach 2:
The patent incorporates spiral flow patterns and curved geometric transitions in the outlet portion design. These curved structures guide gas flow smoothly, reduce turbulence, and improve pressure distribution, enhancing gas flow efficiency while maintaining compatibility with conventional manufacturing capabilities.
4Duration of action of moving object
If larger tank volume is used to ensure sufficient reaction gas supply, then the gas supply duration is extended, but byproduct generation and duct clogging increase
Solution Approach 1:
The patent optimizes the tank volume parameter to a specific small range (0.16-0.24 liters) that provides sufficient gas supply duration for complete ALD cycles while minimizing the total amount of reaction gas stored. This reduced gas quantity directly decreases byproduct generation and exhaust line clogging, addressing the harmful effects without compromising process completeness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system achieves efficient gas supply with reduced byproducts, ensuring good step coverage and minimizing duct clogging, thereby improving production efficiency and yield.
Implementation Method 1
a mass flow controller (MFC), configured to control an amount of the reaction gas supplied to the reaction chamber
Implementation Method 2
a tank arranged between the reaction chamber and the MFC to store the reaction gas
Implementation Method 3
a valve arranged between the tank and the reaction chamber
Data Source
AI summary
A reaction gas supply system includes a reaction chamber configured to process a substrate using a reaction gas, a mass flow controller (MFC) configured to control an amount of the reaction gas supplied to the reaction chamber, a tank between the reaction chamber and the MFC, the tank having a cylindrical inner space configured to store the reaction gas, and an outlet portion configured to discharge the reaction gas from the tank, and a valve between the tank and the reaction chamber, the outlet portion of the tank having a gradually decreasing diameter toward the valve.