Reaction Vessel Attachment Jig for Substrate Processing
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Solution Overview
Problem
Conventional substrate processing apparatuses face challenges in maintaining reaction vessels without altering device height or vessel size, leading to complex and time-consuming maintenance procedures due to the need for separate attachment and detachment of the outer tube and furnace throat flange, which complicates the maintenance process and increases the height of the apparatus.
Innovation Solution
A substrate processing apparatus with a reaction vessel featuring a heating device, a lid member, an attachment/detachment jig on the lid member, and a support section on the reaction vessel's inner wall that abuts the attachment/detachment jig, allowing for maintenance without changing the device height or vessel size, enabling simultaneous attachment and detachment of the reaction vessel components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the exhaust tube diameter is increased to improve gas flow, then the gas flow capability is improved, but the device height increases making installation difficult
Solution Approach 1:
The reaction vessel is divided into separate components (outer tube and furnace throat flange) that can be attached and detached independently. This segmentation allows the exhaust tube to be optimized for gas flow while the overall device height is controlled by the modular structure.
Solution Approach 2:
The exhaust tube is configured to extend horizontally from the furnace throat flange rather than vertically, changing the dimension in which the exhaust function is achieved. This allows large diameter exhaust tubes to be used without increasing the vertical height of the device.
2Productivity
If the reaction vessel height is increased to process more wafers, then the processing capacity is improved, but the device height increases
Solution Approach 1:
The reaction vessel is segmented into modular components that can be configured in different heights. The outer tube and furnace throat flange can be attached or detached based on production requirements, allowing flexibility in wafer processing capacity while controlling overall device height.
3Ease of repair
If the outer tube and furnace throat flange are separately attached to simplify maintenance, then the ease of repair is improved, but the device complexity increases
Solution Approach 1:
The reaction vessel is divided into separable components (outer tube and furnace throat flange) connected by a coupling structure. This segmentation enables independent maintenance of each component while the coupling mechanism maintains a relatively simple overall structure.
Solution Approach 2:
A coupling structure acts as an intermediary between the outer tube and furnace throat flange, enabling easy attachment and detachment while maintaining structural integrity. This intermediary component simplifies the maintenance process without requiring complex disassembly mechanisms.
4Device complexity
If the reaction vessel components are integrally formed to reduce complexity, then the device complexity is reduced, but the ease of repair worsens
Solution Approach 1:
The reaction vessel is designed with separable components (outer tube and furnace throat flange) that can be independently removed for maintenance. This segmentation provides ease of repair while maintaining relatively simple integral structures for each component.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution simplifies the maintenance process by allowing for single-person operation, reducing the need for complex assembly and disassembly, and enhancing safety while maintaining the apparatus's height and throughput without dividing the reaction vessel components.
Implementation Method 1
a heating device that heats the substrate from an outer peripheral side of the reaction vessel
Implementation Method 2
a heating device that heats the substrate from an outer peripheral side of the reaction vessel
Data Source
AI summary
To provide a substrate processing apparatus, comprising: a reaction vessel having a processing chamber inside that processes a substrate; a heating device that heats said substrate from an outer peripheral side of the reaction vessel; a lid member that closes the processing chamber; an attachment/detachment jig placed on the lid member for attaching/detaching the reaction vessel from an inside of the heating device; and a support section provided in an upper side of a lower end of the reaction vessel on an inside wall of the reaction vessel, and abutted on an upper surface of the attachment/detachment jig for attaching/detaching the reaction vessel from the inside of the heating device.