Reactive Particle Output Control for In-Situ Vacuum Chamber Cleaning
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Solution Overview
Problem
Vacuumed chambers used in object evaluation and manufacturing systems face inefficiencies in cleaning due to the need for deactivation and re-activation during reactive particle cleaning, which increases downtime and reduces throughput.
Innovation Solution
A reactive particles supply system that adjusts output conditions such as pressure, flow rate, and concentration to allow for cleaning while the chamber remains active, using an adjustable gas supply unit and reactive particles output unit with interchangeable apertures to maintain optimal vacuum pressure and cleaning rates without deactivation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If reactive particles are supplied to clean the vacuumed chamber, then cleaning effectiveness is improved, but vacuum pressure increases significantly requiring chamber deactivation
Solution Approach 1:
The patent introduces a localized cleaning region within the vacuumed chamber by positioning a reactive particles supply unit to direct particles at a specific location. This allows cleaning to occur in a confined area rather than throughout the entire chamber, minimizing the impact on overall vacuum pressure and enabling cleaning without full chamber deactivation.
Solution Approach 2:
The patent employs an intermediary approach by using a reactive particles supply unit that can be selectively activated. This intermediary device allows controlled introduction of reactive particles only when and where needed, rather than requiring complete chamber deactivation for cleaning operations.
2Reliability
If reactive particles are supplied to clean the vacuumed chamber, then cleaning is achieved, but chamber deactivation and re-activation is required reducing throughput
Solution Approach 1:
The patent enables continuous operation of the vacuumed chamber by implementing cleaning capability that does not require chamber deactivation. The reactive particles supply unit can be activated independently to perform cleaning while the chamber remains in its operational state, ensuring continuous productive action without interruption.
Solution Approach 2:
The patent introduces dynamic control of the reactive particles supply system, allowing the cleaning operation to be adjusted and performed on-demand without fixed shutdown schedules. This dynamic approach optimizes the balance between cleaning needs and productive operation, improving overall chamber throughput.
3Reliability
If reactive particles are supplied to clean the vacuumed chamber, then cleaning occurs, but the vacuumed chamber must be deactivated
Solution Approach 1:
The patent segments the cleaning function from the overall chamber operation by introducing a separate reactive particles supply unit. This segmentation allows the cleaning function to be independently controlled and executed without affecting the main chamber operation, simplifying the operational sequence and reducing complexity.
Solution Approach 2:
The patent implements a self-service cleaning capability where the reactive particles supply unit can perform cleaning operations autonomously without requiring full chamber deactivation. This self-service approach simplifies operation by eliminating the need for complex shutdown and restart procedures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient and contamination-free cleaning of vacuumed chambers by maintaining optimal vacuum pressure and adjusting cleaning modes to suit operational conditions, reducing downtime and improving throughput.
Implementation Method 1
The vacuumed chamber can be cleaned by using a reactive particles supply system that directs a stream of reactive particles into the vacuumed chamber
Implementation Method 2
The stream of reactive particles significantly increases the vacuum pressure within the vacuumed chamber
Data Source
AI summary
A reactive particles supply system that may include an adjustable gas supply unit that is arranged to supply gas and to set a gas condition, a reactive particles supply unit that may be arranged to receive the gas, and an adjustable reactive particles output unit that may include a reactive particles input, a second reactive particles output, and a reactive particles path. The second reactive particles output is configured to output reactive particles towards an opening of a vacuumed chamber. The adjustable reactive particles output unit is arranged to mechanically configure at least one element of the reactive particles path according to the reactive particles condition.


