Reactive Polysiloxane Resin Composition for Low-Loss Optical Waveguides
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Solution Overview
Problem
Existing optical waveguide materials suffer from high light absorption in the near-infrared region, poor heat resistance, and inadequate productivity, particularly when exposed to high-temperature solder reflow and requiring multiple processing steps.
Innovation Solution
A curable resin composition comprising a polysiloxane resin with specific reactive groups, a (meth)acrylic acid derivative, and a radical polymerization initiator, optimized for low light absorption, high heat resistance, and excellent UV curability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If fluorinated polyimide is used as optical waveguide material, then light absorption in near-infrared region is reduced, but high-temperature baking is required causing cracking and requiring reactive ion etching increasing process complexity
Solution Approach 1:
The patent changes the chemical composition parameters by incorporating fluorinated cyclic carbonates with specific molecular structures (Formula 1) into the resin system, achieving low light absorption without requiring high-temperature baking or reactive ion etching processes
Solution Approach 2:
The patent creates a composite resin system combining fluorinated cyclic carbonate monomers with other compatible monomers and oligomers, achieving synergistic effects that provide both low light absorption and ease of processing without complex manufacturing steps
2Ease of manufacture
If conventional polymer materials are used for optical waveguides, then cost is reduced and processing is simplified, but heat resistance is insufficient when exposed to high-temperature solder reflow
Solution Approach 1:
The patent modifies the resin composition by incorporating fluorinated cyclic carbonates that raise the glass transition temperature and thermal stability parameters, enabling the material to withstand solder reflow temperatures while maintaining UV curability and processing ease
3Ease of manufacture
If organic/inorganic hybrid materials are used, then photolithography patterning is enabled with no byproducts, but near-infrared absorption is not sufficiently small
Solution Approach 1:
The patent changes the chemical structure by incorporating fluorinated cyclic carbonate monomers with specific molecular formulas that reduce near-infrared absorption coefficients while maintaining compatibility with photolithography processing
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves low light absorption, high heat resistance, and improved productivity, enabling efficient formation of optical waveguides and adhesives with enhanced UV curability and handleability.
Implementation Method 1
a curable resin composition containing a polysiloxane resin having one or more reactive groups selected from the group consisting of a (meth)acryloyl group and a styryl group, a (meth)acrylic acid derivative, and a radical polymerization initiator
Data Source
AI summary
An object of the present invention is to provide a material that has small absorption (low light absorption loss) in the near-infrared region used in optical communication, has excellent heat resistance, and, in addition, can produce a cured article having excellent productivity (UV curability) and also to provide an optical waveguide and an optical adhesive made from the material. Specifically, provided is a curable resin composition containing components (A) to (C) as essential components: (A) a polysiloxane resin having one or more reactive groups selected from the group consisting of a (meth)acryloyl group and a styryl group; (B) a (meth)acrylic acid derivative having a structure represented by General Formula (1); and (C) a radical polymerization initiator.