Rear Laser Wafer Edge Scanning for Stacked Wafer Alignment

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Solution Overview

Problem

Existing methods for wafer alignment and detection require multiple sensors, leading to interface management and component arrangement challenges, especially when dealing with stacked wafers, and increase the time required for inspection processes.

Innovation Solution

A semiconductor transfer device equipped with a single laser scanner that scans the edges of wafers from the rear, using a detection unit to determine the presence and alignment of wafers by measuring peak distances in predetermined vertical areas, allowing for simultaneous detection of multiple wafers.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If multiple sensors are used for wafer detection and alignment, then detection accuracy is improved, but device complexity increases

Engineering Contradiction:
Improvewafer detection accuracyVSAvoidsensor arrangement complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent combines multiple detection functions (presence detection, alignment detection, and stacking number detection) into a single laser scanner. The laser scanner emits laser beams that reflect off wafer edges, and the reflection amount detection unit processes all detection tasks using one integrated sensor system, eliminating the need for multiple separate sensors and their associated interface management complexities.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The single laser scanner is designed to perform multiple functions: detecting wafer presence, determining wafer alignment, and counting stacked wafers. By making the laser scanner a multi-functional device that can handle all detection requirements, the system achieves high measurement precision without the device complexity that would result from using multiple specialized sensors.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If multiple sensors are installed for each wafer, then wafer alignment detection is improved, but ease of operation deteriorates

Engineering Contradiction:
Improvewafer alignment detectionVSAvoidinterface management
Core Design Contradiction:
Measurement precisionVSEase of operation

Solution Approach 1:

The patent merges all wafer detection operations into a single laser scanner interface. Instead of managing multiple sensor interfaces for different detection tasks, the system uses one unified interface that handles presence detection, alignment detection, and stacking number detection, significantly improving ease of operation while maintaining detection precision.

Inventive Principle:
Principle #5Merging (Combining)

3Measurement precision

If die-to-die comparison method is used for wafer inspection, then measurement precision is improved, but productivity decreases

Engineering Contradiction:
Improvewafer inspection accuracyVSAvoidinspection speed
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent extracts the essential detection information (wafer edge reflection amounts) and processes it directly through calculation units that determine presence, alignment, and stacking number. This eliminates the time-consuming die-to-die comparison process by using a more direct measurement approach that achieves comparable precision faster, thereby improving productivity.

Inventive Principle:
Principle #2Taking out (Extraction)

4Device complexity

If a single laser scanner is used for multiple wafers, then device complexity is reduced, but measurement precision may deteriorate

Engineering Contradiction:
Improvesensor quantityVSAvoidsimultaneous detection accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The laser scanner is designed as a universal detection device that can simultaneously detect multiple wafers at different positions. By equipping the single scanner with multi-functional capabilities and using it in a multi-functional configuration, the system maintains high measurement precision for simultaneous detection of multiple wafers while reducing device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent detects wafers in the vertical stacking direction by measuring reflection amounts from different height positions. This dimensional approach allows a single laser scanner to detect multiple wafers simultaneously by analyzing reflection data from different vertical levels, maintaining precision without requiring multiple scanners.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution simplifies the detection process, reduces the number of sensors needed, and decreases the time required for wafer inspection by enabling the use of a single laser scanner to determine the presence and alignment of multiple stacked wafers efficiently.

Implementation Method 1

a laser scanner disposed on a rear side of a mounted wafer and radiating a laser to a portion of an edge of the wafer

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS20240063039A1Apparatus and method of detecting wafer edge using laser scanner, and semiconductor transfer device
Publication Date: 2024.02.22 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20240063039A1 patent drawing
  • US20240063039A1 patent drawing
  • US20240063039A1 patent drawing

AI summary

An apparatus and method of detecting a wafer edge using a laser scanner, and a semiconductor transfer device are provided. The apparatus for detecting a wafer edge using a laser scanner includes a laser scanner disposed on a rear side of a mounted wafer and radiating a laser to a portion of an edge of the wafer, and a detection unit receiving an image acquired by the laser scanner and detecting the wafer edge in the image. The detection unit determines whether each wafer is present or aligned according to wafer edges detected in a plurality of wafer areas in the image.