Weak-Acid Resist Development With Rear-Side Gas Flow Control
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Solution Overview
Problem
Existing substrate treatment systems face challenges in effectively developing metal-containing resist films on substrates post-exposure, particularly in ensuring uniform treatment and preventing adhesion of development-time products to the rear surface of the substrate.
Innovation Solution
A developing apparatus that generates a developing fluid containing gas of a weak acid and mist, discharging it towards the front surface of the substrate while simultaneously directing inert gas towards the rear surface to prevent adhesion of development-time products, using a developing unit with a chamber and discharge ports for controlled fluid and gas distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If developing fluid is discharged only toward the front surface of the substrate, then development effectiveness is improved, but adhesion of development-time products to the rear surface occurs
Solution Approach 1:
The discharge system is segmented into multiple discharge ports positioned at different locations (front surface and rear surface) to deliver developing fluid and gas to different regions of the substrate simultaneously, preventing adhesion while maintaining development effectiveness
Solution Approach 2:
Different regions of the substrate receive different treatments: the front surface receives developing fluid for pattern formation, while the rear surface receives gas to prevent adhesion of development-time products, creating localized quality differences in the treatment process
2Manufacturing precision
If conventional developing methods are used, then simple apparatus structure is maintained, but uniform development of metal-containing resist films cannot be ensured
Solution Approach 1:
The developing apparatus is designed with multi-functionality, where the same chamber and discharge system handle both developing fluid delivery and gas discharge operations, achieving uniform development without requiring completely separate systems for each function
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures uniform development of metal-containing resist films on substrates by preventing rear surface adhesion, enhancing treatment efficiency and effectiveness.
Implementation Method 1
a developing fluid generator configured to generate, from a developing liquid, a developing fluid containing at least one of gas and mist of a weak acid
Implementation Method 2
the developing part discharges the developing fluid from the discharge port toward a front surface side of the substrate in the treatment space, and has other discharge port for discharging a predetermined gas toward a rear surface side of the substrate in the treatment space
Data Source
AI summary
A developing apparatus for developing a substrate on which a resist film has been formed and which has been subjected to exposure processing, comprises: a developing fluid generator configured to generate, from a developing liquid, a developing fluid containing at least one of gas and mist of a weak acid; and a developing part having a chamber forming a treatment space for housing the substrate and provided with a discharge port for discharging the developing fluid into the treatment space, and configured to develop the substrate with the developing fluid, wherein: the developing part discharges the developing fluid from the discharge port toward a front surface side of the substrate in the treatment space, and has other discharge port for discharging a predetermined gas toward a rear surface side of the substrate in the treatment space.