Rear Surface Cleaning Unit for Substrate Transfer
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
During semiconductor manufacturing, foreign substances like particles and metal impurities on substrates cause defects and contamination, and existing cleaning processes struggle to efficiently remove liquids from substrates, especially from the rear surface during transfer, leading to residual contamination in the chamber.
Innovation Solution
A substrate treating apparatus and method that includes a liquid treating chamber, a drying chamber, and a transfer unit with a rear surface cleaning unit, utilizing a contact or non-contact member to remove treatment liquids from the substrate's rear surface while transferring, ensuring efficient cleaning and drying.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If liquid is supplied to the substrate to remove foreign substances, then cleaning effectiveness is improved, but liquid remains on the substrate rear surface causing contamination
Solution Approach 1:
The rear surface cleaning unit performs preliminary cleaning action during the transfer process before the substrate enters the drying chamber. This removes liquid from the rear surface while the substrate is still being transported, preventing subsequent contamination and ensuring the substrate is ready for the next processing step.
Solution Approach 2:
A dedicated rear surface cleaning unit is introduced as an intermediary component between the liquid treatment chamber and the drying chamber. This separate unit specifically addresses the rear surface liquid removal function, which was previously neglected, without interfering with the main cleaning process.
2Productivity
If substrate is transferred between chambers, then processing efficiency is improved, but liquid separates from substrate during transfer causing chamber contamination
Solution Approach 1:
The rear surface cleaning unit performs preliminary liquid removal during the transfer process itself, before the substrate completes its journey to the drying chamber. This timing ensures that liquid does not have the opportunity to separate and contaminate the chamber environment.
Solution Approach 2:
The cleaning action is made continuous with the transfer process. The rear surface cleaning unit operates throughout the transfer duration, maintaining cleaning effectiveness without interrupting the substrate flow between chambers, thus preserving processing efficiency.
3Manufacturing precision
If excessive liquid is supplied to remove particles, then particle removal is improved, but liquid separation during transfer increases contamination risk
Solution Approach 1:
The rear surface cleaning unit performs preliminary removal of excess liquid during transfer, before the substrate reaches the drying chamber. This prevents the excess liquid from separating and causing contamination, while still allowing sufficient liquid to remain for effective particle removal.
Solution Approach 2:
The cleaning function is applied locally and selectively to the rear surface of the substrate through the dedicated rear surface cleaning unit. This localized approach addresses the specific problem area without affecting the overall liquid distribution needed for particle removal on the front surface.
Data Source
AI summary
Disclosed is an apparatus for treating a substrate. The apparatus for treating the substrate includes a liquid treating chamber for liquid-treating the substrate by supplying a treatment liquid to the substrate, a drying chamber for drying the substrate by supplying a process fluid to the substrate, a transfer unit for transferring the substrate between the liquid treating chamber and the drying chamber, and a rear surface cleaning unit for cleaning a rear surface of the substrate, in which the rear surface cleaning unit may clean the rear surface of the substrate while transferring the substrate from the liquid treating chamber to the drying chamber.