Reciprocating Nozzle Cleaning for Wafer Frame Units
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Solution Overview
Problem
The existing cleaning methods for wafer processing units, which include a semiconductor wafer, an affixed tape, and an annular frame, are inefficient as they require a longer time to clean the frame unit due to the increased traveling distance of the cleaning nozzle, leading to decreased productivity.
Innovation Solution
A cleaning method that involves holding the frame unit on a spinner table and using a cleaning nozzle to jet a cleaning liquid in a reciprocating manner along specific paths above the affixed object and frame, allowing for separate cleaning steps with tailored cleaning strengths for each component to optimize cleaning time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the cleaning nozzle moves in a reciprocating manner to clean the entire frame unit including the annular frame, then the frame and affixed object are thoroughly cleaned, but the cleaning time is extended and productivity is decreased
Solution Approach 1:
The cleaning process is divided into two distinct steps: first cleaning the affixed object (wafer) by moving the cleaning nozzle reciprocatingly, and then cleaning the frame by rotating the spinner table without reciprocating motion. This segmentation allows each component to receive appropriate cleaning treatment with optimized time allocation, resolving the contradiction between thorough cleaning and productivity.
2Reliability
If the cleaning nozzle travels a longer distance to cover the entire frame unit, then complete cleaning is achieved, but the required cleaning time increases
Solution Approach 1:
The cleaning method dynamically adjusts the cleaning nozzle motion strategy based on the component being cleaned. For the affixed object, reciprocating motion provides thorough cleaning. For the frame, rotational motion of the spinner table suffices. This dynamic adaptation optimizes cleaning time while maintaining completeness.
Solution Approach 2:
The affixed object is cleaned first by reciprocating the cleaning nozzle, removing processing waste from the critical area. Then the frame is cleaned by simple rotation. This preliminary cleaning of the affixed object allows the subsequent frame cleaning to be performed more quickly without compromising overall cleaning completeness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for a shorter cleaning time for the frame unit by ensuring the affixed object and frame receive the necessary cleaning strengths in separate steps, reducing excessive cleaning and enhancing productivity.
Implementation Method 1
a cleaning nozzle that jets a cleaning liquid
Implementation Method 2
The cleaning liquid is supplied to the cleaning nozzle through the shaft portion and the arm portion, and the cleaning liquid is jetted downward from the cleaning nozzle
Data Source
AI summary
A cleaning method for cleaning a frame unit including an affixed object, a tape affixed to an undersurface of the affixed object, and an annular frame to which an outer peripheral portion of the tape is affixed, the cleaning method including: an affixed object cleaning step of cleaning the affixed object by jetting a cleaning liquid from a cleaning nozzle while moving the cleaning nozzle in a reciprocating manner along a path extending from above one end of an outer peripheral edge of the affixed object to above another end of the outer peripheral edge of the affixed object; and a frame cleaning step of cleaning the frame by jetting the cleaning liquid from the cleaning nozzle to the frame.