Recirculating Injector Conduit for Semiconductor Fluid Dispensation
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Solution Overview
Problem
Current semiconductor deposition systems face issues such as material stagnation, heat-induced chemical changes, clogging, and contamination due to non-recirculating fluid conduits, which lead to inefficiencies and precision problems in chemical dispensation during processes like CVD and ALD.
Innovation Solution
A recirculating injector system with a conduit that continuously flows fluid, reducing heat transfer and vibration effects, and incorporating a pump and filter system to maintain fluid distribution and purity, along with a controller for precise fluid management and pressure control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If materials are allowed to stagnate in the conduit, then the system structure is simplified, but material precipitation, condensing, cracking, clogging, and chemical change occur
Solution Approach 1:
The patent implements a recirculating conduit system that continuously flows carrier gas through the conduit, preventing material stagnation. The carrier gas flows in a closed loop from the injector through the conduit back to the injector, ensuring continuous movement and preventing precipitation, condensing, cracking, clogging, and chemical change that occur with stagnant materials.
2Device complexity
If conventional non-recirculating conduits are used, then the system is simpler, but precision in chemical dispensation deteriorates due to stagnation and environmental exposure
Solution Approach 1:
The recirculating conduit maintains continuous flow of carrier gas, preventing material stagnation and ensuring consistent chemical dispensation precision by eliminating exposure to environmental conditions that cause variability.
3Productivity
If materials are exposed to environmental conditions for prolonged periods, then the process is simpler, but heat-induced physical and chemical changes occur
Solution Approach 1:
The patent uses an inert carrier gas (such as nitrogen or argon) that flows continuously through the conduit, creating an inert environment that protects materials from heat-induced physical and chemical changes while maintaining process simplicity.
4Reliability
If recirculating conduit is implemented, then material stagnation and chemical changes are prevented, but system complexity and cost increase
Solution Approach 1:
The patent combines the supply and return conduits into a single recirculating loop system, where the carrier gas flows from the injector through the conduit and returns to the injector. This merging of functions reduces the number of separate components needed while maintaining material stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The recirculating system prevents material stagnation and chemical changes, maintains fluid purity, and allows for precise control of chemical dispensation, enhancing the efficiency and precision of semiconductor fabrication processes.
Implementation Method 1
a recirculating conduit in fluid communication with the injector such that the conduit continuously flows carrier gas
Implementation Method 2
incorporating a pump and filter system to maintain fluid distribution and purity
Implementation Method 3
incorporating a pump and filter system to maintain fluid distribution and purity
Data Source
AI summary
One embodiment of the present subject matter includes a system which includes a tank, a conduit is adapted to carry a recirculating supply of fluid from the tank and into the tank, and at least one injector adapted to dispense fluid from the recirculating supply of fluid into a chamber.