Recirculation Purging System for Optical Module Storage
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing packaging systems fail to maintain cleanliness during storage and transport of electrical and optical modules due to contamination from the environment and packaging materials, especially under pressure changes, where contaminants are introduced into sealed storage chambers and cannot be effectively removed by subsequent gas flushing.
Innovation Solution
A purging apparatus with a gas purifier and particle filter that establishes a continuous flow of high-purity purge gas within the storage chamber, filtering and recirculating the gas to remove contaminants such as acids, bases, organic compounds, water, and oxygen, ensuring cleanliness by maintaining a closed-loop recirculation system.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a sealed storage chamber is used to prevent contamination, then cleanliness is improved, but contaminants are introduced during pressure changes in transport
Solution Approach 1:
The system performs preliminary purging of the storage chamber before introducing components, removing contaminants that may be present in the chamber environment. This preliminary action prevents contamination before it can occur, addressing the seal integrity issue by ensuring the chamber is clean regardless of pressure changes during transport
Solution Approach 2:
The purging system operates continuously during storage and transport, maintaining a constant flow of clean gas through the storage chamber. This continuous action ensures that contaminants are constantly removed and prevented from accumulating, maintaining seal integrity and cleanliness throughout the entire storage and transport cycle
2Object-affected harmful factors
If high purity inert gases are used for flushing, then some contaminants are removed, but gas-phase contaminants remain on device surfaces
Solution Approach 1:
The system replaces conventional mechanical flushing methods with a chemical/purification-based approach. Instead of relying solely on physical flushing with inert gases, the system uses gas purifiers that chemically remove contaminants from the gas phase, enabling more effective removal of contaminants from device surfaces
Solution Approach 2:
The system changes the parameters of the purge gas by continuously purifying it through multiple stages (particle filters, gas purifiers) to achieve extremely high purity levels. This parameter change in gas purity enables the system to remove contaminants that would otherwise remain on device surfaces after conventional flushing
3Object-affected harmful factors
If a purging system with continuous gas flow is implemented, then cleanliness is maintained, but system complexity increases
Solution Approach 1:
The system merges multiple functions into integrated components: the particle filter and gas purifier are combined in a single purging apparatus, and the same apparatus serves multiple purposes including purging, pressure equalization, and contamination prevention. This merging reduces overall system complexity while maintaining effectiveness
Solution Approach 2:
The purging system is designed to be self-regulating, with the gas flow automatically adjusting to maintain positive pressure in the storage chamber. The system self-corrects pressure imbalances and continuously purifies the gas without requiring external intervention, reducing operational complexity while maintaining high cleanliness standards
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively maintains the cleanliness of stored components by continuously providing a high-purity gas flow, reducing the risk of contamination and preventing water condensation, thereby minimizing defects and increasing storage flexibility.
Implementation Method 1
The particle filter may receive and filter the exhaust gas. The filtered gas may be provided to the gas purifier for purification and recirculation.
Implementation Method 2
The gas purifier may purify the filtered gas by substantially removing at least one of: an acid, a base, an organic compound, water or oxygen from the filtered gas.
Data Source
AI summary
A purging apparatus for a storage chamber is disclosed. The purging apparatus is configured for establishing a purge gas flow through the storage chamber. The purging apparatus may include a gas purifier and a particle filter. The gas purifier may provide a purge gas to the storage chamber. The purge gas may flow through the storage chamber, and a mixture of the purge gas and potential contaminants may subsequently exit the storage chamber as exhaust gas. The particle filter may receive and filter the exhaust gas. The filtered gas may be provided to the gas purifier for purification and recirculation. The gas purifier may purify the filtered gas by substantially removing at least one of: an acid, a base, an organic compound, water or oxygen from the filtered gas. The purified filtered gas may then be recirculated and provided to the storage chamber as the purge gas.