Redistribution Layer Collar Structure for Bond Pad Reliability

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Solution Overview

Problem

Existing semiconductor device packaging configurations face challenges in accommodating sophisticated features and applications, leading to potential reliability issues, performance limitations, and increased costs.

Innovation Solution

A semiconductor device with a redistribution layer is developed, featuring a first non-conductive layer forming a collar structure around a bond pad opening, and a second non-conductive layer with different formulation, preventing direct contact with the bond pad. A conductive redistribution layer is formed over the second non-conductive layer, enabling direct connection to the bond pad through the opening.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If non-conductive layers are formed directly over bond pads to enable redistribution layer formation, then manufacturing is simplified, but electrochemical degradation and stress increase, reducing reliability

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoiddevice reliability
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The collar structure acts as an intermediary barrier between the non-conductive layers and the bond pad. It prevents direct contact while still allowing the redistribution layer to be formed and connected to the bond pad through the opening, thus eliminating electrochemical degradation without complicating the manufacturing process

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The non-conductive layer formation process is segmented into multiple steps: first forming a collar structure around the bond pad opening, then forming the main non-conductive layer. This segmentation allows the collar to protect the bond pad while the rest of the structure provides manufacturing simplicity

Inventive Principle:
Principle #1Segmentation

2Device complexity

If non-conductive layers directly contact bond pads to simplify structure, then device complexity is reduced, but electrochemical degradation occurs, harming performance

Engineering Contradiction:
Improvestructure complexityVSAvoidelectrochemical degradation
Core Design Contradiction:
Device complexityVSObject-generated harmful factors

Solution Approach 1:

The collar structure serves as a mediator that blocks the harmful electrochemical interaction between non-conductive layers and bond pads, while maintaining structural simplicity and enabling straightforward redistribution layer formation

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The collar structure provides localized protection only at the bond pad region where electrochemical degradation is most problematic, while the rest of the device maintains simple construction with direct non-conductive layer formation

Inventive Principle:
Principle #3Local quality

3Productivity

If non-conductive layers are formed without collar structures to reduce manufacturing steps, then productivity increases, but stress and degradation increase, lowering reliability

Engineering Contradiction:
Improvemanufacturing efficiencyVSAvoiddevice reliability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The collar structure is formed in advance before the main non-conductive layer is deposited. This preliminary action prepares the structure to prevent electrochemical degradation from the outset, ensuring reliability without adding significant manufacturing complexity

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The collar structure acts as a pre-positioned intermediary barrier that protects the bond pad during subsequent manufacturing steps, allowing efficient production while maintaining high reliability

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS20250038138A1Semiconductor device with redistribution layer and method therefor
Publication Date: 2025.01.30 BV NXP BV
  • US20250038138A1 patent drawing
  • US20250038138A1 patent drawing
  • US20250038138A1 patent drawing

AI summary

A method of manufacturing a semiconductor device is provided. The method includes forming a first non-conductive layer over a top side a semiconductor die and patterning the first non-conductive layer to form a collar structure surrounding an opening exposing a top surface of a bond pad. A second non-conductive layer is formed over the first non-conductive layer and exposed portions of the top side of the semiconductor die. The second non-conductive layer is different from the first non-conductive layer. The second non-conductive layer is patterned to expose the top surface of the bond pad and inner sidewalls of the of the collar structure surrounding the opening such that the second non-conductive layer does not contact the bond pad. A metal redistribution layer is formed over the second non-conductive layer and exposed top surface of the bond pad.