Reflective Layer Patterning Using Color Filter Mask
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Solution Overview
Problem
Current display devices face challenges in efficiently manufacturing LCDs with a color filter on array (COA) structure, where the alignment of pixel electrodes and color filters can lead to errors, and the use of multiple masks complicates the manufacturing process, increasing costs and time.
Innovation Solution
The display device incorporates a reflective layer with a pattern defined using a color filter as a mask, eliminating the need for a separate reflective layer mask, and includes a light blocking member to prevent ambient light from reaching the thin film transistor, thereby simplifying the manufacturing process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a separate reflective layer mask is used in the manufacturing process, then the alignment precision of pixel electrodes and color filters can be improved, but the device complexity and manufacturing time increase
Solution Approach 1:
The patent combines the color filter layer and reflective layer into a single integrated structure. The reflective layer is formed as part of the color filter manufacturing process, eliminating the need for a separate reflective layer mask. This merging of functions reduces the number of manufacturing steps while maintaining alignment precision through the single mask approach.
Solution Approach 2:
The color filter layer serves multiple functions: it provides color filtering and simultaneously acts as the reflective layer pattern definition. By making the color filter structure multi-functional, the patent eliminates the need for a separate reflective layer mask, reducing manufacturing complexity while maintaining the necessary alignment precision.
2Manufacturing precision
If multiple masks are used in the manufacturing process, then the alignment precision of components can be improved, but the manufacturing time and costs increase
Solution Approach 1:
The patent merges the reflective layer pattern definition with the color filter layer formation. By using the color filter mask to define both the color filter pattern and the reflective layer pattern simultaneously, the manufacturing process requires fewer masking steps, reducing both time and cost while maintaining component alignment precision.
Solution Approach 2:
The reflective layer material is deposited on the substrate before the color filter layer is formed. This preliminary action allows the subsequent color filter mask to serve dual purposes: defining the color filter pattern and simultaneously defining the reflective layer pattern through a single etching step, thereby reducing total manufacturing time.
3Illumination intensity
If the reflective layer and color filter are positioned to overlap the thin film transistor, then the light reflection efficiency is improved, but the thin film transistor is exposed to ambient light causing performance degradation
Solution Approach 1:
The patent segments the reflective layer and color filter structure into multiple regions with different functions. The reflective layer is positioned to overlap the color filter for efficient light reflection, while a light blocking member is introduced to segment and block ambient light from reaching the thin film transistor. This segmentation allows simultaneous optimization of light reflection and protection of the thin film transistor.
Solution Approach 2:
A light blocking member is introduced as an intermediary element between the ambient light source and the thin film transistor. This mediator blocks harmful ambient light from reaching the thin film transistor while allowing the reflective layer and color filter to maintain their optimal positioning for light reflection efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the mask process, reduces manufacturing time and costs, and ensures accurate alignment of pixel electrodes and color filters, enhancing the efficiency of LCD production.
Implementation Method 1
The patterning of the reflective layer material may include wet etching
Implementation Method 2
a light blocking member on the first insulating layer, the light blocking member overlapping the thin film transistor
Data Source
AI summary
A display device includes a first substrate, a thin film transistor on the first substrate, a passivation layer on the thin film transistor, a reflective layer on the passivation layer, a color filter on the reflective layer, the reflective layer having a substantially same shape as that of the color filter in a plan view, a first insulating layer on the color filter, a pixel electrode on the first insulating layer, a second substrate opposing the first substrate, and a liquid crystal layer between the first substrate and the second substrate.