Reflective Mirror Redirects Stray Laser Beams to Prevent Drip Pin Clogging

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Solution Overview

Problem

EUV lithography systems face challenges with clogging in drip pins due to solidification of debris liquid, leading to contamination and reduced performance, which affects the efficiency and longevity of the collector and overall tool performance.

Innovation Solution

Incorporating a reflective mirror to redirect stray laser beams towards the drip pins, preventing debris liquid from solidifying by using the laser heat, thus addressing clogging and contamination issues without additional heat sources.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If no reflective mirror is used, then device complexity is low, but clogging in drip pins occurs due to solidification of debris liquid

Engineering Contradiction:
Improveclogging preventionVSAvoiddevice complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent converts the harmful stray laser beams into a beneficial resource by using a reflective mirror to redirect them toward the drip pins. The stray laser heat, which would otherwise be wasted, is now utilized to prevent debris liquid solidification and clogging in the drip pins, transforming a harmful element into a useful function.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The reflective mirror acts as an intermediary element that transfers the stray laser energy to the drip pins region. This mediator component enables the indirect heating of the debris liquid through the mirror's reflection, allowing heat transfer without direct laser-beam contact with the target area.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If additional heat sources are added, then clogging is prevented, but device complexity and energy consumption increase

Engineering Contradiction:
Improveclogging preventionVSAvoidenergy consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The system performs self-service by utilizing its own stray laser energy to address the clogging problem. Instead of requiring external heat sources, the reflective mirror redirects existing laser beams within the system to heat the debris liquid, making the system self-sufficient and eliminating additional energy consumption.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The patent recovers wasted laser energy that would otherwise be discarded as stray beams. By capturing this wasted energy through the reflective mirror and directing it to the drip pins, the system recovers useful heat from an otherwise useless energy source, improving overall energy efficiency.

Inventive Principle:
Principle #34Discarding and recovering

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach effectively prevents clogging in drip pins, enhances EUV tool performance, extends collector longevity, and recycles wasted laser energy for efficient heating, improving the overall efficiency and reliability of the EUV lithography process.

Implementation Method 1

redirect stray laser beams towards the drip pins, preventing debris liquid from solidifying by using the laser heat

Methodology Applied
Scientific EffectLaser heating: Laser

Implementation Method 2

Incorporating a reflective mirror to redirect stray laser beams

Methodology Applied
Scientific EffectReflection: Reflection

Data Source

PatentUS11948702B2Radiation source apparatus and method for using the same
Publication Date: 2024.04.02 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11948702B2 patent drawing
  • US11948702B2 patent drawing
  • US11948702B2 patent drawing

AI summary

A radiation source apparatus includes a vessel, a laser source, a collector, a horizontal obscuration bar, and a reflective mirror. The vessel has an exit aperture. The laser source is configured to emit a laser beam to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to reflect the collected radiation to the exit aperture of the vessel. The horizontal obscuration bar extends from a sidewall of the vessel at least to a position between the laser source and the exit aperture of the vessel. The reflective mirror is in the vessel and connected to the horizontal obscuration bar.