Reflector Plate Baffle for Substrate Stability
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Solution Overview
Problem
Rapid thermal processing (RTP) substrates experience substrate movement due to pressure deltas between the substrate and reflector plate during cooling, affecting processing throughput.
Innovation Solution
A reflector plate assembly with a baffle and gas conduit system that synchronizes the expansion or contraction of the baffle with gas flow to maintain substrate stability on the support ring, preventing movement by controlling gas passage and pressure within the processing chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If the substrate is quickly moved away from the bottom of the chamber toward the reflector plate during cooling, then the cooling speed is improved, but a pressure delta is created causing substrate movement relative to the support ring
Solution Approach 1:
A baffle is introduced as an intermediary component between the substrate and the reflector plate. The baffle includes a through-hole that allows controlled gas flow while physically mediating the pressure differential effects. This intermediary structure enables the substrate to be quickly moved toward the reflector plate for rapid cooling while preventing excessive substrate movement caused by pressure deltas through the controlled gas flow path.
Solution Approach 2:
The invention uses gas flow control through the baffle's through-hole to manage pressure differentials during substrate movement. By controlling the pneumatic flow of gas through the baffle, the system maintains pressure balance between the substrate and reflector plate sides, preventing substrate displacement while enabling rapid cooling movement.
2Stability of the object's composition
If a baffle is added to control pressure and stabilize the substrate, then substrate position stability is improved, but the device complexity increases
Solution Approach 1:
The baffle is designed to perform multiple functions simultaneously: it acts as a structural support element, a gas flow control component, and a pressure balance mechanism. The through-hole in the baffle serves both as a gas passage and as a means to control pressure differentials. By making the baffle multi-functional, the invention stabilizes substrate position without proportionally increasing device complexity.
Solution Approach 2:
The baffle incorporates a through-hole that functions similarly to porous structures by allowing controlled passage of gas while maintaining structural integrity. This controlled permeability enables pressure equalization and substrate stabilization without requiring complex additional components, thus limiting the increase in device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution stabilizes the substrate on the support ring, enhancing processing throughput by preventing misalignment and ensuring uniform cooling, thereby improving the efficiency of RTP.
Implementation Method 1
a gas conduit, a plurality of gas passages having a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit
Implementation Method 2
thermal radiation is used to rapidly heat a substrate in a controlled environment to a maximum temperature of over 1200° C. above room temperature
Data Source
AI summary
Embodiments of the present disclosure generally relate to a reflector plate assembly. The reflector plate assembly includes a reflector plate and a baffle. The reflector plate includes a gas conduit, a plurality of gas passages, a plurality of lift pin holes, and a gas inlet. The gas conduit includes a first opening on a front side of the reflector plate and a second opening on a backside of the reflector plate adjacent to the gas conduit. The baffle is attached at a first end to a support base of an edge ring. The baffle is attached at a second end to the backside of the reflector plate. The baffle forms an opening in the backside of the reflector plate to the gas conduit.