Reflector for Infrared Light Confinement in Substrate Processing
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Solution Overview
Problem
Existing substrate processing apparatuses face inefficiencies in heating substrates due to high transmittance or absorptance materials in process vessels, leading to inefficient infrared light usage for heating.
Innovation Solution
A substrate processing apparatus with a process vessel made of transparent materials, a reflector to reflect infrared light, and a combination of susceptor and lamp heaters to enhance heating efficiency, along with an electromagnetic field generation electrode to generate plasma for process gas excitation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If the process vessel is made of a material with high transmittance to infrared light, then the infrared light can pass through the vessel wall, but the infrared light leaks out of the process vessel reducing heating efficiency
Solution Approach 1:
A reflector is introduced as an intermediary component between the heater and the process vessel. The reflector captures infrared light that would otherwise leak out through the transparent process vessel wall and redirects it back into the process chamber, thereby reducing energy loss and improving heating efficiency without changing the material properties of the process vessel itself.
2Loss of energy
If the process vessel is made of a material with high absorptance to infrared light, then the infrared light is absorbed by the vessel wall, but the heating efficiency of the substrate is reduced
Solution Approach 1:
The reflector serves as a mediator that intercepts infrared light before it can be absorbed by the process vessel wall. By positioning the reflector between the heater and the vessel, the system redirects the infrared radiation back toward the substrate, preventing energy loss through absorption and maintaining effective heating.
Solution Approach 2:
The system changes the optical parameters of the process chamber by introducing a reflective surface. This alters the path and distribution of infrared light within the chamber, transforming the interaction between radiation and vessel material from absorption to reflection, thereby improving energy utilization.
3Productivity
If a reflector is added to confine infrared light, then heating efficiency is improved, but the device complexity increases
Solution Approach 1:
The heating system is segmented into distinct functional components: the heater, the reflector, and the process vessel. This segmentation allows each component to be optimized independently - the reflector can be designed with specific geometric properties to maximize light confinement while maintaining simplicity in overall system architecture.
Solution Approach 2:
The reflector is designed as a simple intermediary component with a straightforward geometric shape (such as a cylindrical or conical surface) that can be easily manufactured and integrated. This minimizes the increase in device complexity while still achieving the desired light confinement effect.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves heating efficiency by confining infrared light within the process vessel, allowing for faster temperature elevation and energy savings while maintaining plasma generation efficiency.
Implementation Method 1
a heater configured to radiate an infrared light to heat a substrate accommodated in the process chamber
Implementation Method 2
a reflector provided between the process vessel and the electromagnetic field generation electrode and configured to reflect the infrared light radiated from the heater
Implementation Method 3
an electromagnetic field generation electrode extending along an outer peripheral surface of the process vessel while being spaced apart from the outer peripheral surface of the process vessel and configured to generate an electromagnetic field in the process vessel by being supplied with a high frequency power
Implementation Method 4
a surface of the pattern formed on the substrate may be modified by performing a modification process by using a process gas excited by a plasma
Data Source
AI summary
Described herein is a technique capable of improving a heating efficiency for a substrate to be heated by a heater. According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including: a process vessel defining a process chamber; a process gas supplier configured to supply a process gas into the process vessel; an electromagnetic field generation electrode extending along an outer peripheral surface of the process vessel while being spaced apart from the outer peripheral surface of the process vessel and configured to generate an electromagnetic field in the process vessel by being supplied with a high frequency power; a heater configured to radiate an infrared light to heat a substrate accommodated in the process chamber; and a reflector provided between the process vessel and the electromagnetic field generation electrode and configured to reflect the infrared light radiated from the heater.