Region-Segmented Light Source Matching for Lithography Resolution
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Solution Overview
Problem
Existing light source optimization methods in integrated circuit manufacturing fail to achieve a desired optimization effect due to uneven light source distribution, leading to suboptimal light source shapes and intensities.
Innovation Solution
A method involving region segmentation of initial light sources, matching with multiple patterns, calculating optimal patterns for each sub-region, and generating an optimized light source by combining the best matching patterns, optionally using pixelation and intensity thresholds to enhance concentration and shape.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional light source optimization algorithms (genetic algorithm, particle swarm optimization, linear programming) are used, then optimization can be performed, but the light source intensity cannot be concentrated enough to achieve desired optimization effect and shape
Solution Approach 1:
The patent divides the light source optimization problem into multiple sub-problems by segmenting the light source intensity distribution into different regions. Each region is optimized independently through separate matching operations, allowing concentrated intensity control in specific areas while maintaining overall optimization goals. This segmentation approach resolves the contradiction by enabling localized intensity concentration without requiring complex global optimization algorithms.
Solution Approach 2:
The patent applies different matching patterns and optimization strategies to different regions of the light source based on local requirements. By providing at least two different matching patterns and selecting the best match for each sub-light source region, the method achieves locally optimized intensity distribution that concentrates light where needed while maintaining appropriate distribution elsewhere, thus improving manufacturing precision without excessive complexity.
2Shape
If region segmentation and multiple matching patterns are used, then light source intensity concentration and shape are improved, but calculation complexity increases
Solution Approach 1:
The patent performs preliminary actions by pre-defining multiple matching patterns before the actual optimization process. These patterns are prepared in advance and can be directly applied to segmented light source regions, avoiding the need for complex real-time calculations during optimization. This preliminary preparation reduces calculation complexity while still achieving improved light source shape and intensity concentration.
Solution Approach 2:
The patent uses matching patterns that are essentially simplified copies or templates of desired light source configurations. Instead of performing complex calculations to determine optimal shapes, the method copies pre-designed patterns and applies them to different regions, selecting the best match based on simple comparison metrics. This copying approach achieves good shape results with reduced computational complexity.
Data Source
AI summary
The method for optimizing a light source in integrated circuit manufacturing, includes following steps: S1, providing an initial light source; S2, performing region segmentation according to light intensity distribution of the initial light source to obtain a plurality of sub light source regions; S3, providing at least two matching patterns and matching them with each sub light source region to obtain at least two matching results corresponding to each sub light source region; S4, performing calculating based on the at least two matching results and each sub light source region to obtain a best matching pattern corresponding to each sub light source region; and S5, generating a light source to be optimized based on the best matching pattern corresponding to each sub light source region.