Reinforced Pellicle Structure for EUV Impact and Particle Control

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Solution Overview

Problem

Existing pellicles lack sufficient impact resistance and are prone to generating foreign matter when irradiated with high-energy light such as EUV, and the adhesives used to fix the pellicle film to the support member degrade, further contributing to defects in semiconductor manufacturing.

Innovation Solution

A pellicle design featuring a pellicle film reinforced by a second reinforcing layer, preferably made of carbon nanotubes, oriented parallel to the support surface, and optionally a first reinforcing layer, to enhance impact resistance and stability, while using materials that resist decomposition under EUV exposure.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Strength

If the pellicle film is fixed on the support member through an adhesive or sticky agent, then the pellicle film can be attached to the support member, but the adhesive decomposes under EUV irradiation to generate foreign matter

Engineering Contradiction:
Improveattachment strengthVSAvoidforeign matter generation
Core Design Contradiction:
StrengthVSObject-generated harmful factors

Solution Approach 1:

The invention removes the adhesive layer from the pellicle structure, replacing it with a mechanical fixation method where the pellicle film is directly stretched and fixed on the frame. This eliminates the source of foreign matter generation while maintaining attachment functionality through the tensioned film structure.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The pellicle film itself is designed as a composite material containing both reinforcing fibers for strength and UV-absorbing particles for photostability. This composite structure allows the film to be self-supporting without adhesives, fixing it to the frame through its own structural integrity rather than through decomposable bonding agents.

Inventive Principle:
Principle #40Composite materials

2Use of energy by moving object

If the pellicle film is made thin for EUV transparency, then EUV light can pass through effectively, but the impact resistance decreases

Engineering Contradiction:
ImproveEUV transparencyVSAvoidimpact resistance
Core Design Contradiction:
Use of energy by moving objectVSStrength

Solution Approach 1:

The pellicle film is constructed as a composite containing reinforcing fibers dispersed within a thin transparent matrix. The fibers provide mechanical strength and impact resistance, while the thin matrix maintains EUV transparency. This composite structure allows simultaneous optimization of both transparency and strength.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The reinforcing fibers are distributed locally throughout the pellicle film to provide strength only where mechanically needed, while the overall thin structure maintains optical transparency. The fibers are positioned to reinforce the film structure without blocking EUV light paths.

Inventive Principle:
Principle #3Local quality

3Strength

If a first reinforcing layer is added on the support member side, then impact resistance is improved, but the structure complexity increases

Engineering Contradiction:
Improveimpact resistanceVSAvoidstructure complexity
Core Design Contradiction:
StrengthVSDevice complexity

Solution Approach 1:

The first reinforcing layer is integrated directly with the support member structure, merging the reinforcement function with the existing frame architecture. This combination approach strengthens the overall structure without adding separate, complex components, as the reinforcing layer becomes part of the support member itself.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The reinforced pellicle design improves impact resistance and reduces foreign matter generation, ensuring durability and transparency, thereby enhancing the reliability of semiconductor manufacturing processes.

Implementation Method 1

a second reinforcing layer configured to reinforce the pellicle film... the second reinforcing layer is disposed in an area where the pellicle film overlaps the support member

Methodology Applied
Scientific EffectImpact absorption: Absorption (physical)

Implementation Method 2

When the pellicle film is irradiated with EUV, the EUV passes through the pellicle film; however, a portion of the irradiated EUV is absorbed by the pellicle film. Light energy of the absorbed EUV is converted into thermal energy to raise the temperature of the pellicle film.

Methodology Applied
Scientific EffectLight absorption and thermal conversion: Absorption (EM radiation)

Implementation Method 3

the carbon nanotubes in the second reinforcing layer are oriented in a parallel direction with respect to the support surface of the frame

Methodology Applied
Scientific EffectMaterial orientation:

Data Source

PatentEP4692932A1Pellicle and method for manufacturing pellicle
Publication Date: 2026.02.11 LINTEC CORP
  • EP4692932A1 patent drawingFigure 1
  • EP4692932A1 patent drawingFigure 2
  • EP4692932A1 patent drawingFigure 3

AI summary

An object is to provide a pellicle capable of improving impact resistance and suppressing generation of foreign matter. A pellicle (120) includes a pellicle film (10), a support member (30) that supports the pellicle film (10), and a second reinforcing layer (50) for reinforcing the pellicle film (10). The second reinforcing layer (50) is disposed in an area where the pellicle film (10) overlaps the support member (30) in a plan view of the pellicle film (10) supported by the support member (30), on a side of a second pellicle film surface (12) opposite a first pellicle film surface (11) facing the support member (30).