Reinforced Pellicle Structure for Impact Resistance and Low Contamination
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing pellicles face challenges in enhancing impact resistance and preventing the generation of foreign matter when exposed to high-energy light such as EUV, particularly due to the decomposition of adhesives or sticky agents used in traditional pellicle frames.
Innovation Solution
A pellicle design incorporating a support member with a first reinforcing layer made of materials like carbon nanotubes, graphene, or silicon nitride, oriented vertically to enhance impact resistance, and optionally a second reinforcing layer oriented parallel to the pellicle film, along with a pellicle film made of similar materials, to improve durability and prevent foreign matter generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If adhesive or sticky agent is used to fix the pellicle film on the support member, then the pellicle film can be easily attached, but the adhesive decomposes under EUV irradiation to generate foreign matter
Solution Approach 1:
The invention removes the adhesive layer from the pellicle structure, replacing it with a support member that has an integrated rough surface for direct mechanical adhesion of the pellicle film, thereby eliminating the source of foreign matter generation under EUV irradiation
Solution Approach 2:
The support member features a localized rough surface treatment (such as protrusions or recesses) in the region where the pellicle film is attached, providing enhanced mechanical adhesion without requiring adhesive materials throughout the entire structure
2Ease of manufacture
If traditional adhesive materials are used to bond the pellicle film, then the bonding process is simple, but the adhesive lacks heat resistance and decomposes under high-energy light
Solution Approach 1:
The invention replaces the chemical bonding mechanism (adhesive) with a mechanical bonding mechanism (rough surface interlocking), where the pellicle film is physically anchored to the support member through surface irregularities, providing both simplicity and high heat resistance
3Device complexity
If the pellicle film is directly attached to the support member without reinforcement, then the structure is simple, but the impact resistance is insufficient
Solution Approach 1:
The invention creates a composite structure where the pellicle film is mechanically bonded to a support member with a rough surface, combining the transparency and thinness of the film with the mechanical strength and impact resistance of the reinforced support structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The pellicle design significantly enhances impact resistance and reduces foreign matter generation, improving productivity and extending the pellicle's lifespan in semiconductor manufacturing processes.
Implementation Method 1
the first reinforcing layer contains at least one material selected from the group consisting of carbon nanotube, graphene, graphite, diamond-like carbon, amorphous carbon, silicon, silicon carbide, silicon nitride, and boron nitride
Implementation Method 2
When the pellicle film is irradiated with EUV, the EUV passes through the pellicle film; however, a portion of the irradiated EUV is absorbed by the pellicle film. Light energy of the absorbed EUV is converted into thermal energy to raise the temperature of the pellicle film.
Data Source
Figure 1
Figure 2
Figure 3
AI summary
An object is to provide a pellicle capable of improving impact resistance and suppressing generation of foreign matter. A pellicle (100) includes: a pellicle film (10); a support member (30) including a frame (31) and an opening (32); and a first reinforcing layer (40). The first reinforcing layer (40) is disposed in an area between the pellicle film (10) and the support member (30), where the pellicle film (10) and the support member (30) overlap each other in a plan view of the pellicle film (10) supported by the support member (30). The first reinforcing layer (40) contains at least one material selected from the group consisting of carbon nanotube, graphene, silicon carbide, silicon nitride, and boron nitride and the like. When the first reinforcing layer (40) contains carbon nanotubes, the carbon nanotubes are oriented in a vertical direction with respect to a support surface (34).