3D Structure Fabrication via Relief Structured Phase Mask
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Solution Overview
Problem
Conventional methods for manufacturing three-dimensional (3D) periodic structures on the micron and submicron scale are limited in fabricating large volume and large area structures, and lack ease of fabrication and defect control for various lattice types.
Innovation Solution
A method and system for continuously fabricating 3D structures using a relief structured material with a patterned surface, where a photosensitive layer is exposed to radiation through a relief structured material, generating a 3-dimensional light intensity pattern that forms micron or submicron features, and a multilayer material system with a master drum and exposure source for post-exposure processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional fabrication methods (colloidal sedimentation, polymer phase separation, templated growth, fluidic self-assembly, multiple beam interference lithography, multiple exposures, printing, molding, writing) are used to manufacture 3D periodic structures, then micron or submicron features can be created, but the methods are not applicable for fabricating large volume and large area structures and lack ease of fabrication and defect control
Solution Approach 1:
The invention divides the fabrication process into separate functional stages: (1) forming the relief structured material with patterned surface, (2) exposing the photosensitive layer through the relief structures to generate 3D light intensity patterns, and (3) developing the exposed material to form final 3D structures. This segmentation allows each stage to be optimized independently, enabling large volume and area fabrication while maintaining precision.
Solution Approach 2:
The invention transitions from conventional 2D planar fabrication to 3D volumetric structuring by utilizing the relief structured material as a phase mask that generates three-dimensional light intensity patterns. This dimensional transition enables the formation of complex 3D periodic structures with controlled features in all three spatial dimensions, overcoming the limitations of traditional 2D-based methods.
2Adaptability or versatility
If conventional fabrication methods are used, then 3D periodic structures can be manufactured, but they do not present the capability of building different types of lattices with ease of fabrication and with fabrication defect control
Solution Approach 1:
The invention enables versatile lattice fabrication by allowing dynamic adjustment of key parameters including the relief structured material's pattern geometry, the exposure radiation's wavelength and intensity distribution, and the photosensitive material's chemical properties. By changing these parameters, different lattice types can be generated using the same fundamental process, achieving both adaptability and ease of manufacture.
Solution Approach 2:
The relief structured material serves multiple functions simultaneously: it acts as a phase mask for generating 3D light intensity patterns, a template for defining structural geometry, and a protective layer during exposure. This multi-functionality simplifies the overall fabrication process and enables versatile lattice construction without requiring separate components for each function, thereby improving ease of manufacture.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables continuous fabrication of 3D structures with high fabrication tolerances and controlled feature density, allowing for the creation of larger structures with micron or submicron periodicity and quasi-periodicity, overcoming limitations of conventional techniques.
Implementation Method 1
the pattern of relief structures formed on the first surface of the first layer generates a three-dimensional light intensity pattern of the radiation that is incident on the second layer
Implementation Method 2
a second layer comprising a photosensitive material that is disposed on the first layer. The relief structured material is exposed to radiation through the first layer
Data Source
AI summary
A method and system are provided for fabricating three-dimensional (3D) structures having micron or submicron features. The method includes providing a continuously-formed relief structured material, the relief structured material having a first layer comprising a material having a pattern of relief structures formed on a first surface thereof. The structured material includes second layer comprising a photosensitive material that is disposed on the first layer. The relief structured material is exposed to radiation through the first layer, where the pattern of relief structures formed on the first surface of the first layer generates a 3-dimensional light intensity pattern of the radiation that is incident on the second layer. The exposed material is developed, where the developed material comprises a plurality of 3D structures having micron or submicron features.