Remote Plasma Oxidation with Independent Dilution Injection
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Solution Overview
Problem
Conventional remote plasma sources are incompatible with high concentrations of hydrogen plasma, leading to damage to dielectric surfaces and undesirable metal contamination on substrates during semiconductor manufacturing.
Innovation Solution
A processing system with a remote plasma source and a second gas source, where a first gas radical is produced and introduced into a processing chamber using a first nozzle, and a second gas is introduced using multiple nozzles, allowing for the mixing of gases to form oxidation radicals while maintaining conformality and reducing H+ damage to dielectric liners.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If conventional remote plasma sources are used with high concentrations of hydrogen plasma, then hydrogen ion concentration increases, but dielectric surfaces of the remote plasma source suffer damage
Solution Approach 1:
The gas delivery system is segmented into multiple nozzles positioned at different locations within the processing chamber. This allows hydrogen gas to be introduced in a distributed manner rather than through a single point, reducing localized ion concentration and minimizing damage to dielectric surfaces while maintaining overall hydrogen plasma concentration
Solution Approach 2:
A diluent gas is introduced as an intermediary substance between the hydrogen plasma source and the dielectric surfaces of the remote plasma source. This diluent gas reduces the concentration of hydrogen ions that reach the dielectric surfaces, preventing damage while allowing high concentrations of hydrogen plasma to be maintained in the processing chamber
2Quantity of substance
If hot-wire dissociation is used to produce atomic hydrogen, then radical hydrogen species are generated, but metal contamination occurs on the substrate surface
Solution Approach 1:
The mechanical hot-wire filament system is replaced with a plasma-based dissociation system. Instead of using thermal energy from a heated wire to dissociate hydrogen molecules, the invention uses plasma energy to generate atomic hydrogen radicals, eliminating the source of metal contamination while maintaining the desired radical hydrogen species concentration
Solution Approach 2:
The method of hydrogen dissociation is changed from thermal (hot-wire) to plasma-based. This parameter change in the dissociation mechanism allows atomic hydrogen to be generated without the presence of metal filaments, thus preventing metal contamination on substrate surfaces while still achieving high atomic hydrogen concentrations
3Productivity
If high-pressure oxidation processes are implemented, then throughput and conformality improve, but damage to dielectric components increases
Solution Approach 1:
The oxidation process is segmented into multiple zones within the processing chamber, with gas introduction points distributed throughout. This allows high-pressure oxidation to proceed efficiently in the processing volume while reducing localized stress and damage to dielectric components through distributed gas flow rather than concentrated high-pressure injection
Solution Approach 2:
A diluent or buffer gas is used as an intermediary to mediate between the high-pressure oxidation process and the dielectric components. This intermediary gas reduces the direct impact of high-pressure plasma on dielectric surfaces while maintaining the oxidation reactions in the processing chamber, thus protecting dielectric components while preserving throughput
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system enables high-pressure oxidation processes with improved conformality, throughput, and oxide quality, while minimizing damage to dielectric components and avoiding metal contamination.
Implementation Method 1
a processing gas is provided to the remote plasma source, a plasma is formed from the processing gas in the remote plasma source
Implementation Method 2
molecular hydrogen is thermally dissociated into radical (atomic) species through collision with a hot-wire filament
Data Source
AI summary
The disclosure provides system, computer readable medium, and method for producing a hydroxyl radical. A plasma of a plasma gas is formed, via a controller, using a remote plasma source fluidly coupled to a gas inlet conduit coupled to a first nozzle of a processing chamber. A first gas radical is produced by flowing a first gas from a first gas source through the remote plasma source. The first gas radical is introduced into the processing chamber using the gas inlet conduit coupled to the first nozzle. A second gas from a second gas source is introduced using a plurality of second nozzles fluidly of the processing chamber. An oxidation radical is produced by mixing the first gas radical and the second gas in the processing chamber.